Online information source for semiconductor professionals
Product Briefings > Materials and Gases
New Product: Matera’s new automated SENTRY analyses harsh chemistries in fab
07 June 2006 | Materials and Gases
Product Briefing Outline: Metara has introduced the
‘SENTRY' Harsh Chemistry Metrology (HCM) system that the company claims
is the first of its kind to be able in fully automated mode to analyze
harsh ultra-pure chemicals for metallic contamination excursions.
Read more >>New Product: Alternative to hydroxylamine based resist etch residue remover
24 May 2006 | Materials and Gases
Product Briefing Outline: Mallinckrodt Baker has
introduced its ‘ALEG-380' photoresist stripper and residue remover as a
cost-effective alternative to hydroxylamine-based chemistries in
aluminum IC manufacturing processes. ALEG-380 is 100% water-soluble
formulation that does not require an intermediate rinse, helping fabs
improve yields and reduce manufacturing costs.
Read more >>