Product Briefing Outline: SAFC Hitech has introduced
the ‘EpiVapor’, a metalorganic vapor phase distribution system for
compound semiconductor manufacturing. EpiVapor is designed to eliminate
the need for localized tool bubblers and TCUs by delivering vapors from
highly volatile and sensitive pyrophoric liquids directly to MOCVD
systems.
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Product Briefing Outline: SAFC Hitech has introduced
the OM700, a bubbler that offers a cost-efficient migration path to
controlled precursor delivery for larger lot sizes, enabling a
reduction in process downtime, combined with increased safety controls.
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Product Briefing Outline: Veeco Instruments has
introduced the ‘HarmoniX’, a powerful new atomic force microscope (AFM)
technique for high-resolution nanoscale imaging and analysis. Veeco’s
HarmoniX Nanoscale Material Property Mapping enables AFM users to
simultaneously, and in real-time, acquire high-resolution images as
well as high-resolution, quantitative material property maps. This
technique is effective for characterization of soft materials, thin
films, small particles, or domains within a bulk solid.
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Product Briefing Outline: Edwards has introduced
the new iXH series of vacuum pumps, used for harsh process
environments. Designed to meet the increasing demands of the emerging
processes required for semiconductor manufacturing at 60nm and smaller
design rules, the iXH is designed to help reduce tool cost-of-ownership
(CoO) with a smaller footprint than previous generations, and also
features a modular design that enables a quicker response to emerging
process requirements.
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Product Briefing Outline: Levitronix has introduced
the new ‘BPS 600’ magnetically levitated pump technology, designed for
demanding applications in the semiconductor industry such as CMP slurry
delivery, copper electroplating and wafer cleaning at leading-edge
process nodes. The patented impeller floats in a magnetic field only
touching the fluid it is pumping, and can be fully integrated into a
fully-closed loop electronic control system without the need of
additional controller hardware.
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Product Briefing Outline: Rohm and Haas Electronic
Materials’ CMPTechnologies division has introduced the ‘VisionPad’ 5000
CMP pad, specifically designed for defectivity reduction in shallow
trench isolation (STI) and interlayer dielectric (ILD) applications.
The new pad targets volume manufacturing of memory and logic chips at
65nm and below.
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Product Briefing Outline: Applied Chemical
Laboratories has introduced ‘ACL-585 HiPER-Solv’ (patents pending), a
high performance etch residue solvent that is claimed to realize a
significant improvement in removal of post-etch hardened polymers and
polymer residue from metal and via etch processes when compared with
conventional hydroxylamine or solvent-amine products. ACL-585 is
specifically formulated for advanced sub-90 nm design rules that
incorporate high density plasma etch. The solvent is new non-corrosive
and environmentally benign.
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Product Briefing Outline: Tiger Optics has recently
unveiled the HALO+, a mini-Cavity Ring-Down Spectroscopy (CRDS)
analyzer capable of measuring moisture from 200 parts-per-trillion to
20 parts-per-million levels. It offers similar dynamic range for other
detections as well. An evolution of the compact HALO analyzer, the new
HALO+ is equally small, but offers greater sensitivity, and
communication, analysis, and trending capabilities comparable to
Tiger's flagship LaserTrace and MTO analyzers.
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Product Briefing Outline: Cabot Microelectronics has
claimed a major breakthrough in its CMP technology with improvements to
its B6600 platform of barrier CMP slurries for advanced technology
nodes. B6600 barrier slurry platform is tunable, enabling the products
to be easily customized to deliver improved planarity and defect
performance across a wide range of integration schemes. The B6600
barrier slurry products are being produced and used worldwide for
technology nodes from 90nm through 45nm, according to the company.
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Product Briefing Outline: Carl Zeiss SMT has
officially launched the ‘ORION' Helium ion microscope based on
proprietary intellectual property developed by ALIS Corporation, a
Peabody, Massachusetts-based start-up company acquired by Carl Zeiss
SMT in 2006. According to Carl Zeiss SMT, this new microscope is
capable of providing images of unrivalled high resolution, surface
information and material contrast, unachievable with any other
microscopy instrument available today.
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