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Product Briefings > Materials and Gases

New Product: SAFC Hitech now offers bulk vapor deposition distribution for MOCVD systems

05 June 2008 | Materials and Gases
SAFCProduct Briefing Outline: SAFC Hitech has introduced the ‘EpiVapor’, a metalorganic vapor phase distribution system for compound semiconductor manufacturing. EpiVapor is designed to eliminate the need for localized tool bubblers and TCUs by delivering vapors from highly volatile and sensitive pyrophoric liquids directly to MOCVD systems. Read more >>

New Product: SAFC Hitech’s OM700 enables efficient organometallic precursor delivery

03 June 2008 | Materials and Gases
SAFCProduct Briefing Outline: SAFC Hitech has introduced the OM700, a bubbler that offers a cost-efficient migration path to controlled precursor delivery for larger lot sizes, enabling a reduction in process downtime, combined with increased safety controls. Read more >>

New Product: Veeco offers real-time material property mapping for AFMs

02 June 2008 | Materials and Gases
VeecoProduct Briefing Outline: Veeco Instruments has introduced the ‘HarmoniX’, a powerful new atomic force microscope (AFM) technique for high-resolution nanoscale imaging and analysis. Veeco’s HarmoniX Nanoscale Material Property Mapping enables AFM users to simultaneously, and in real-time, acquire high-resolution images as well as high-resolution, quantitative material property maps. This technique is effective for characterization of soft materials, thin films, small particles, or domains within a bulk solid. Read more >>

New Product: Edwards’ iXH vacuum pump series handles sub-60nm harsh process environments

14 May 2008 | Materials and Gases
EdwardsProduct Briefing Outline: Edwards has introduced the new iXH series of vacuum pumps, used for harsh process environments. Designed to meet the increasing demands of the emerging processes required for semiconductor manufacturing at 60nm and smaller design rules, the iXH is designed to help reduce tool cost-of-ownership (CoO) with a smaller footprint than previous generations, and also features a modular design that enables a quicker response to emerging process requirements. Read more >>

New Product: Levitronix’s ‘BPS 600’ maglev pumps eliminate CMP slurry particle agglomeration

14 May 2008 | Materials and Gases
LevitronixProduct Briefing Outline: Levitronix has introduced the new ‘BPS 600’ magnetically levitated pump technology, designed for demanding applications in the semiconductor industry such as CMP slurry delivery, copper electroplating and wafer cleaning at leading-edge process nodes. The patented impeller floats in a magnetic field only touching the fluid it is pumping, and can be fully integrated into a fully-closed loop electronic control system without the need of additional controller hardware. Read more >>

New Product: VisionPad 5000 from Rohm and Haas reduces CMP scratch and chatter marks

31 January 2008 | Materials and Gases
RohmProduct Briefing Outline: Rohm and Haas Electronic Materials’ CMPTechnologies division has introduced the ‘VisionPad’ 5000 CMP pad, specifically designed for defectivity reduction in shallow trench isolation (STI) and interlayer dielectric (ILD) applications. The new pad targets volume manufacturing of memory and logic chips at 65nm and below. Read more >>

New Product: Post etch residue remover from Applied Chemical Laboratories cuts time and costs

07 December 2007 | Materials and Gases
Residue SolventProduct Briefing Outline: Applied Chemical Laboratories has introduced ‘ACL-585 HiPER-Solv’ (patents pending), a high performance etch residue solvent that is claimed to realize a significant improvement in removal of post-etch hardened polymers and polymer residue from metal and via etch processes when compared with conventional hydroxylamine or solvent-amine products. ACL-585 is specifically formulated for advanced sub-90 nm design rules that incorporate high density plasma etch. The solvent is new non-corrosive and environmentally benign. Read more >>

New Product: Tiger Optics’ new HALO+ CRDS analyzer covers widest dynamic range

06 September 2007 | Materials and Gases
TigerProduct Briefing Outline: Tiger Optics has recently unveiled the HALO+, a mini-Cavity Ring-Down Spectroscopy (CRDS) analyzer capable of measuring moisture from 200 parts-per-trillion to 20 parts-per-million levels. It offers similar dynamic range for other detections as well.  An evolution of the compact HALO analyzer, the new HALO+ is equally small, but offers greater sensitivity, and communication, analysis, and trending capabilities comparable to Tiger's flagship LaserTrace and MTO analyzers. Read more >>

New Product: Cabot develops highly tunable B6600 barrier slurry for advanced Cu/low-k

21 August 2007 | Materials and Gases
CabotProduct Briefing Outline: Cabot Microelectronics has claimed a major breakthrough in its CMP technology with improvements to its B6600 platform of barrier CMP slurries for advanced technology nodes. B6600 barrier slurry platform is tunable, enabling the products to be easily customized to deliver improved planarity and defect performance across a wide range of integration schemes. The B6600 barrier slurry products are being produced and used worldwide for technology nodes from 90nm through 45nm, according to the company. Read more >>

New Product: ORION Helium ion microscope from Carl Zeiss SMT breaks new ground in microscopy

ORIONProduct Briefing Outline: Carl Zeiss SMT has officially launched the ‘ORION' Helium ion microscope based on proprietary intellectual property developed by ALIS Corporation, a Peabody, Massachusetts-based start-up company acquired by Carl Zeiss SMT in 2006. According to Carl Zeiss SMT, this new microscope is capable of providing images of unrivalled high resolution, surface information and material contrast, unachievable with any other microscopy instrument available today. Read more >>