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Product Briefings > Lithography

New Product: Eco-Snow technology improves efficiency of photomasks and reticle cleaning

14 January 2010 | Lithography
Product Briefing Outline: Eco-Snow's advanced, automated MaskClean 150 System is a dry CO2 alternative to conventional cleaning methods for removing particulate and light organic contamination from the surface of photomask substrates. The system is helping a major U.S. photomask manufacturer save money and improve the quality of its photomasks and reticles with a cleaning technology designed for the 28nm DRAM half-pitch technology node. The system reclaims masks by removing contaminants left behind by wet cleaning; preserves mask quality by reducing the number of erosive wet cleaning cycles required and reduces the cycle time required to create masks, since fewer cleanings are needed. Read more >>

New Product: Luminescent offers offline computational mask inspection

30 July 2009 | Lithography
Product Briefing Outline: Luminescent Technologies, has broadened its product portfolio by adding what it claims to be the industry’s first offline computational mask inspection product. A premier company in Asia is the first customer to qualify the new computational defect review product in volume production. Read more >>

New Product: New XP upgrade for KLA-Tencorâ??s 28xx defect inspection systems boosts sensitivity

02 July 2009 | Lithography
Product Briefing Outline: KLA-Tencor has announced XP, a new upgrade package for 28xx broadband brightfield inspection systems. The XP package is the first commercially available product to give an inspection system access to standard IC design layout files. With access to this information, the inspection system can use knowledge of the defect’s location within the circuit to better estimate its probability of affecting device yield. In addition, XP can use the results of the design-aware wafer inspection to identify features on the mask that may be particularly sensitive to process variations during printing. These and other features of the XP upgrade package are designed to improve the sensitivity and productivity of existing 28xx inspectors and raise the information content of defect results, helping to accelerate identification and resolution of defect issues. Read more >>

New Product: SOKUDO DUO track system boost throughput to 250-300 wafers per hour

25 June 2009 | Lithography
Product Briefing Outline: Sokudo Co., Ltd. has recently launched the SOKUDO DUO platform, a new concept in photoresist coat/develop track systems that provides customers with the ultra-high productivity needed to optimize leading-edge lithography processing. Incorporating an innovative dual track design, the system simultaneously processes wafers in two lines, claimed to boost throughput to 250-300 wafers per hour (wph), depending on system configuration, while also improving uptime and substantially reducing system footprint. Read more >>

New Product: KLA-Tencor and TELâ??s new modeling software tackles CD control at the 32nm node

14 May 2009 | Lithography | Comments (1)
Product Briefing Outline: KLA-Tencor and Tokyo Electron Limited (TEL) have introduced the ‘AcuShape,’ a new modeling and library-generation package to meet optical critical dimension metrology requirements for the 32nm node and below. The new software package enables metrology engineers in IC fabs to measure the dimensions of 3D logic and memory structures, such as FinFETs, bulb RCATs, and structures created by the advanced patterning technique called spacer pitch splitting. It is designed to operate on KLA-Tencor’s stand-alone optical critical dimension platform, ‘SpectraCD’, and Timbre Integrated Metrology (IM) CD systems. AcuShape has been shipped to several memory, logic and foundry fabs in the United States, Europe, Japan, Korea and Taiwan, where it is being used to measure production wafers and provide early learning on advanced R&D structures. Read more >>

New Product: New analytical method from Entegris extends lithography optics lifetime

19 March 2009 | Lithography
Product Briefing Outline: Entegris has introduced a new solution for accurately measuring and controlling volatile organic compounds that cause contamination in advanced semiconductor lithography processes. If left uncontrolled, these low molecular weight, silicon-containing organic compounds such as Trimethysilanol (TMS) have been shown to impact 248nm and 193nm exposure tools, and can lead to permanent damage of sensitive and costly optical components. Read more >>

New Product: Brion generates co-optimization of source and mask in Tachyon SMO

26 February 2009 | Lithography
Product Briefing Outline: Brion Technologies, a division of ASML, has introduced Tachyon SMO, a new source mask optimization (SMO) product. For the first time, full co-optimization of source and mask is achievable with Tachyon SMO. This product provides the industry with manufacturable low k1 imaging solutions. Read more >>

New Product: ASMLâ??s new TWINSCAN NXT platform has a new planar wafer stage design

29 January 2009 | Lithography | Comments (1)
Product Briefing Outline: ASML has improved its TWINSCANTM lithography platform that offers significant improvements in overlay and productivity, enabling the semiconductor industry to continue its roadmap for more advanced and affordable chips. The TWINSCAN NXT platform is suited for emerging double patterning techniques (DPT) which manufacturers need to shrink the smallest chip features by up to 42 percent. Read more >>

New Product: Reticle Labs targets MaskShop DFM software at reticle repair

05 January 2009 | Lithography
MaskShop is custom image processing software for quantifying post and pre-repaired defect patterns found on reticlesProduct Briefing Outline: Reticle Labs has announced the release of MaskShop, a first in a series of design-for-manufacturing software tools currently under development. MaskShop is custom image processing software for quantifying post and pre-repaired defect patterns found on reticles (masks), eliminating guess work while simultaneously streamlining and expediting the repair process. MaskShop is compatible with the most commonly used imaging systems found in a semiconductor mask fabrication facility. Read more >>

Top 5 new products for 2008

TeraFabOne of the equipment suppliers that consistently brings out new products is KLA-Tencor. However, the metrology supplier rarely figures in the most popular rankings in any given year. That has changed in 2008 with its TeraFab tool. Although only released recently, the fifth most popular product was from TEL and Novellus for copper interconnects. Read more >>