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Product Briefing Outline: Varian Semiconductor Equipment Associates has introduced its newest single wafer high current (SWHC) ion implanter, the ‘VIISta HCP'. This is a fifth generation SWHC product from Varian Semiconductor. According to the company, it has shipped multiple VIISta HCP systems into 65nm production and 45nm development. The systems have been accepted into high volume manufacturing and the company has received additional follow-on orders from leading logic, memory and foundry chipmakers.

Problem: Implant source chambers and beamline elements create particles due to depositions and beam strike. The dual magnet ribbon beam architecture of VIISta HCP isolates the wafer from sources of particles. The second magnet filters out particles generated from beamline elements.

Solution: The VIISta HCP improves productivity at ultra-low energies and also reduces contamination levels. Thus further reducing manufacturing costs The VIISta HCP incorporates new innovations to further increase its productivity. Innovations on the patented dual magnet ribbon beam architecture result in improved beamline transmission, higher on-wafer beam utilization, and higher beam current output. The unique, closed-loop Varian Positioning System (VPS) is claimed to deliver accurate, repeatable and interlocked incident angle control for true zero degree and precise tilted angle implants.

Applications: High current implant at 65-45nm.

Platform: The VIISta HCP is a member of the VIISta suite of single wafer platform ion implanters with over 500 systems installed worldwide.

Availability: July 2006 onwards.