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New Product: Timbre‚??s Profiler Application Server virtually eliminates downtime

26 February 2008 | By Mark Osborne | Product Briefings > Lithography

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TimbreProduct Briefing Outline: Timbre Technologies Inc., a Tokyo Electron-owned company, has announced the introduction of their next generation Profiler Application Server, PAS-T4, used to process optical measurements.

Problem: PAS T4 is optimized for Timbre's ODP 2006 optical metrology platform, and includes a robust fault tolerance module that ensures maximum uptime and system reliability. The new platform, in feedback/control mode, is claimed to dramatically decrease costs through the reduction of re-start times after production-down situations.
Additionally, the new system protects data with a new automatic data loss prevention system.

Solution: The new T4 system will also provide a significant improvement in computation power, with search speeds up to two times faster than previous PAS generations. The speed enhancements enable timely metrology results to accommodate the trend towards higher sample rates and for complex applications such as BEOL, FinFet and advanced STI structures.

Applications: Scatterometry-based optical metrology-ODP.

Platform: T4 has full backwards compatibility with previous versions of PAS and will support all advanced features, including the popular Focus Exposure Monitor (FEM) option for process window analysis and the Desktop Profile Application Client (PAC) option for remote PAS connection.

Availability: March 2007 onwards.


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