Product Briefing Outline: Rudolph Technologies, Inc.
has released its new ‘Synergy MPX' System, which combines Rudolph's
patented ‘PULSE Technology' with new monochromatic microspot x-ray
fluorescence (MMXRF) technology on a single tool platform. This new
addition offers a production-worthy technique to measure the ultrathin
opaque films, such as ALD layers, that will be required for
next-generation processes.
Problem: Rudolph has developed a hybrid metrology
solution to help its customers minimize the equipment, time, and costs
needed for thin-film process control. Synergy MPX allows them to extend
opaque film metrology measurements down into the ultrathin film regime
that will be required at the 65nm technology node and below.
MMXRF
provides certain advantages over conventional XRF, such as smaller
analytical volume, higher sensitivity for the detection of impurities,
and more accurate analysis.
Solution: Accurate
and reproducible ultrathin and ALD film measurements are made with the
new MMXRF technology. Unlike competing systems, the monochromatic
source eliminates virtually all of the background radiation associated
with conventional polychromatic XRF technologies, providing improved
signal-to-noise ratios for accurate and repeatable measurements of
sub-nanometer films. The microspot permits measurements in scribe line
test structures on product wafers. PULSE Technology is a picosecond
ultrasonic laser sonar technique that provides non-contact,
non-destructive opaque film measurements for films ranging from 40
angstroms to 6 micrometers. PULSE Technology can determine RMS
roughness, material density, adhesion, material phase, and interlayer
reactions, as well as low-k and ultra low-k modulus.
Applications:
Include ultrathin films, advanced silicides, FUSI and metal gates,
advanced copper barriers, copper shunt, and dishing and erosion of
dense line arrays.
Platform: Low cost of
ownership is claimed with the VANGUARD-II platform that accommodates
both technologies into a small footprint module. ‘EASy' software is
used, which incorporates years of application knowledge to simplify
operation for novices and experienced users alike.
Availability: Fourth quarter 2006.