Online information source for semiconductor professionals

Product Briefing Outline: Molecular Imprints, Inc. (MII) has introduced the ‘Imprio’ 300, which incorporates improvements in automation, tool throughput and overlay performance. The company claims that the Imprio 300 represents the industry's highest resolution and lowest cost-of-ownership (CoO) patterning solution for IC prototyping and process development at the 32nm node and beyond.

Problem: Efforts at using shorter wavelength lithography solutions to shrink IC feature sizes, such as extreme ultraviolet (EUV) lithography, have met with continuing delays due to numerous technical hurdles, forcing the industry to extend optical lithography using a number of demanding, stop-gap solutions.  This has resulted in extraordinarily challenging chip designs and photomask layouts, as well as complex multiple-patterning processes, all of which increase cost and cycle time, and can lead to lower device yields.  

Solution: MII's Imprio 300 system, leveraging S-FIL (Step and Flash Imprint Lithography) technology, offers sub-10nm resolution patterning in a single exposure using a simplified design and process.  As a result, the system provides an extendible, low CoO patterning solution for multiple design generations.  The ability of the Imprio 300 to create dense, high-resolution structures in two dimensions makes it especially suited to memory applications, where density is paramount. Compared to MII's previous-generation Imprio 250 system, throughput on the Imprio 300 has been increased by 250 percent - further reducing the CoO of imprint lithography to levels consistent with 193nm immersion, and less than that of EUV lithography, according to the company.  Overlay performance has been improved with the ability to provide sub-10nm overlay in test devices.  Even in situations where an Imprio 300 would be used with existing 193nm scanners, overlay performance can be improved by at least 30 percent to sub-35nm (mean+3 sigma).  

Applications: Lithography.

Platform: Built upon the Imprio 250 architecture, the Imprio 300 leverages this reliable platform, as well as its proven service and support infrastructure.  Automation enhancements have also been added to the Imprio 300 that improve precision and operator efficiency.

Availability: Shipments are expected to begin midway through 2008.