Problem: Limitations from current MFC's being used for SDS ion implant applications concerns the full utilization of the SDS gas due to the frequency of source cylinder change-outs and implanter downtime related to change-outs. The use of multiple gas sources increases the number of MFC's used and stored as inventory. There is a need for one MFC type to handle all gas delivery types within the SDS system.
Solution: Implementation of the Low Pressure PiMFC increases source gas utilization, reducing the frequency of source gas cylinder changes, improving tool uptime and COO. Recently, a customer of MKS tested the PiMFC for this application and found a nearly 20% improvement in gas utilization from the SDS source bottle, according to the company. The PiMFC's multi-gas, multi-range feature allows users to configure it for different primary implant gases such as arsine, phosphine, boron trifluoride and others, keeping inventory costs down. According to MKS one fab believes that they can reduce the number of spares from a previous requirement for 8 spares, each with a different configuration, to one spare PiMFC which can cover their 8 gas and flow rate combinations. The PiMFC operates with a very low pressure drop across the device. The patented valve and sensor designs offer exceptional zero stability and accuracy for all flow conditions while maintaining the ability to rapidly achieve setpoint and repeatably control the gas flow.
Applications: Safe Delivery Source systems for arsine, phosphine, boron trifluoride and other gases used in ion implant tools.
Platform: It uses an Ethernet interface and a PC, the embedded configuration and diagnostics software lets users check MFC functionality without removing the MFC. Standard-sized MFC footprint and control I/O are compatible with existing gas lines for easy integration and operation.
Availability: November 2006 onwards.