Online information source for semiconductor professionals

New Product: ‚??Marathon 2 Nano‚?? platform from Brooks offers OEM tool size reductions

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

BrooksProduct Briefing Outline: Brooks Automation has introduced the vacuum process tool automation platform ‘Marathon 2 Nano,’ which is designed to enable smaller footprints for 300mm semiconductor processing equipment. Brooks has included many new features developed from interrelated components that are designed to offer improved process module architecture. Brooks Automation’s Marathon 2 Nano vacuum transfer platform with MagnaTran 9 vacuum robotics and Fusion controls enables a combination of layout flexibility, process module density and overall productivity improvement.

Problem: Today’s semiconductor fabs are under enormous pressure to continuously squeeze more productivity from each square meter of clean room production space. Improved throughput and cycle time reduction strategies require higher overall performance and reduced downtime.

Solution: The Marathon 2 Nano platform offers enhanced flexibility for process module architecture. No longer are cluster tools constrained to conventional radial geometry. With its ultra compact size (500mm x 500mm for a Marathon 2 Nano vacuum transfer module), the Nano platform can be deployed as a single transfer module, in series, parallel, or series/parallel configurations. This flexibility allows high process chamber density and extremely high throughput in a very small footprint. With just two Marathon 2 Nano modules (transfer chamber plus dual-wafer stacked load lock) operating in parallel, throughput is claimed to exceed 400 wafers per hour (WPH). With its width-reducing design, the process module facet adapter plate (FAP), including a slot valve, adds only 50 mm to each facet. Thus, a Marathon 2 Nano platform consisting of vacuum transfer module, process module isolation valves and integrated load lock measures no more than 600mm x 1150mm. This optimized automation footprint provides the highest vacuum process tool throughput per m2 of fab cleanroom space in the industry.

Applications: Wide range of process tools.

Platform: The latest generation of vacuum robotics – MagnaTran 9 – leverages the industry-standard MagnaTran vacuum robot from Brooks Automation. Patent-pending technology offers fast-swap motion
control with fewer physical axes of motion. Furthermore, advanced Fusion controls from Brooks Automation enable the Marathon 2 Nano platform to be the first in the industry where a single controller serves both vacuum and atmospheric automation. This reduces complexity, software control latency while inherently enhancing reliability and overall cost of ownership. All Marathon 2 Nano configurations are supplied with Brooks Automation’s ‘Jet’ Atmospheric systems.

Availability: Currently available.


Related articles

600 employees to transfer from Brooks to Applied Materials - 06 November 2006

Brooks Instrument acquires Key Instruments - 14 April 2009

Chasing the $100 million Fab Automation Business - 01 March 2002

Brooks Automation plans 5 percent staff reduction - 14 February 2008

Brooks Instrument Completes Acquisition of Celerity’s Instrumentation Division - 25 June 2009

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: