Online information source for semiconductor professionals

New Product: Luminescent offers offline computational mask inspection

Popular articles

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

Product Briefing Outline: Luminescent Technologies, has broadened its product portfolio by adding what it claims to be the industry’s first offline computational mask inspection product. A premier company in Asia is the first customer to qualify the new computational defect review product in volume production.

Problem: During the photomask inspection process, operators manually sort through and evaluate defect images to determine if the photomask will result in the desired wafer print. This is time consuming, and since the process is subject to operator variability, it is often inconsistent and unreliable. 

Solution: Luminescent’s computational solution provides automated mask defect review and dispositioning based on aerial images of the photomask.  The product accepts images from commonly used mask defect inspection and review tools, enhances the images, and quickly and accurately determines if the defects are critical or not.  Operator errors are eliminated and defect review cycle time is significantly reduced, in some instances by greater than 75 percent. 

Applications: Photomask inspection.

Platform: Computational defect review opens a broader field which Luminescent calls computational lithography and inspection (CLI). Computational lithography (or computational scaling) uses mathematical models to improve the resolution of light across a critical layer of an integrated circuit (IC).  Computational inspection integrates with computational lithography by using similar mathematical approaches to filter for photomask defects by simulating pattern errors on final silicon.

Availability: July 2009 onwards.


Related articles

Luminescent claims growing customer base for its ‚??Inverse‚?? litho technology - 12 February 2009

New Product: Wafer Plane Inspection technology from KLA-Tencor addresses 32nm mask defect challenges - 14 April 2008

New Product: Mask data verification tool detects potential yield issues in mask manufacturing - 22 May 2006

New Product: SoftJin‚??s NxDAT mask defect analysis software boots inspection productivity - 26 September 2008

Top 5 new products for 2008 - 29 December 2008

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: