Online information source for semiconductor professionals

New Product: KLA-Tencorâ??s PROLITH 10 handles 32nm OPC effects

26 February 2007 | By Mark Osborne | Product Briefings > Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

KLAProduct Briefing Outline: KLA-Tencor has updated and improved its PROLITH lithography optimization product with the launch of PROLITH 10. The new upgrades are designed to enable users to accurately predict lithography process windows for
designs down to 32nm. KLA-Tencor claims that with the accuracy of PROLITH 10, customers have already cut costly experimental lithography wafer runs by up to half, as well as dramatically reducing cycle time to production and speeding time to market.

Problem: It has become virtually impossible to develop a lithography recipe for 32nm designs without an accurate understanding of the impact of OPC (optical proximity correction) on the design due to the low K1 imaging effects.

Solution: For the first time, development groups can utilize on-the-fly exploration modeling to confidently design for the most aggressive - or most cost effective - OPC, knowing that they can quickly and accurately predict production results before
a mature process is available. The latest version of PROLITH enables detailed, predictive model-based OPC, with next-generation shape definition, for immersion lithography-based designs; this provides design for manufacturing (DFM) insight early in the development cycle. Making on-the-fly tradeoffs between process and OPC application, or "co-optimization" of OPC and process is now possible using PROLITH 10.

Applications: Simulates optical lithography, including OPC as well as full resist process, process performance improvements and the effects of process variables.

Platform: PROLITH is a key element in the portfolio of lithography optimization technologies from KLA-Tencor. The ProDATA process window analysis and SEM image analysis tool works with PROLITH to deliver faster lithography optimization.

Availability: February 2007 onwards.

Prolith

Related articles

New Product: PROLITH 11 from KLA-Tencor models double-patterning lithography - 15 July 2008

Printability study with polarization capable aimsâ?˘ fab 193i to study polarization effects - 01 June 2006

SanDisk & Toshiba ready with 32nm 3-bits-per-cell NAND flash production - 12 February 2009

Common Platform alliance partners start 32nm HKMG shuttles in 3Q08 - 14 April 2008

Permeation: Its Effects on Teflon® ETFE Coatings on Stainless Steel Corrosive Fume Exhaust Duct - 01 March 2000

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: