Online information source for semiconductor professionals
New Product: KLA-Tencor goes Linux for OPC & RET requirements in new LithoWare release
Popular articles
Micron moving fast on Hynix in Q208 NAND flash rankings, says iSuppli - 19 August 2008
Numonyx to close California Technology Center - 12 August 2008
Qimonda starts major reorganization: exits PC DRAM market - 13 October 2008
Applied Materials sees higher CapEx spending for 2009 - 15 August 2008
Micron close to Inotera share purchase, says Gartner - 06 October 2008
Product Briefing Outline: KLA-Tencor has launched
LithoWare, a new Linux-based product, which is claimed to enable IC
designers to dramatically reduce the time and cost of developing RET
and OPC processes. LithoWare is a lithography optimization tool based
on the industry-standard PROLITH models that reduces time-to-production
by allowing customers to co-optimize the RET and the process conditions
simultaneously, while minimizing calibration data collection.Problem: Recent estimates are that the number of lithography simulations required to develop a 32nm design could approach hundreds of millions per mask layer. Standard full-chip RET/OPC production models have very limited illumination predictability and do not support process changes on the fly, requiring a lengthy and expensive sequence of mask fabrication, wafer printing, measurement and model calibration that can take days, weeks or even months.
Solution: Operating in a Linux environment allows LithoWare to distribute huge volumes of simulations across a large number of computers, giving engineers the ability to perform advanced computational lithography and explore an extended set of process parameters that would not be possible on individual PCs or with other tools without a major re-calibration effort for each change. LithoWare provides RET/OPC engineers and designers with a tool that is very easy to use compared to conventional tools, according to the company. This can cut cycle times since RET/OPC engineers or designers can quickly check whether their designs or new ideas contain lithography violations. They also do not need to wait for their process engineers or foundry partners to provide proprietary process information and results.
Applications: RET and OPC mask development.
Platform: Most EDA products run on a Linux/Unix environment and LithoWare provides full compatibility with these products without leaving the Linux environment. With LithoWare, users can load GDSII files, select multiple simulation regions, conduct OPC decoration interactively by changing illuminations on the fly, and output an OPC-decorated mask clip as a GDSII file.
Availability: May 2007 onwards.
*Image shows an AMTC mask - not supplied by KLA-Tencor