Product Briefing Outline: JEOL, has introduced a new
high precision direct write e-beam lithography system. The new
JBX-6300FS is a spot beam, vector scan, step and repeat lithography
system designed for high volume direct patterning on wafers, and is
capable of writing minimum line widths of 8nm, according to the
company. 2-inch to 200mm wafers can be accommodated, as well as parts
and pieces. An autoloader allows continuous unattended operation of up
to 10 cassettes under vacuum.
Problem: Continued aggressive scaling of advanced
CMOS processes requires early R&D into future scaling challenges.
Conventional optical lithography tools are unable to pattern features
effectively below 45nm to allow advanced process development.
Solution:
As a cost-effective, next-generation research and development tool, the
new JBX-6300FS excels at nanoimprint lithography (NIL), a method of
fabricating next-generation nanometer scale patterns onto 65mm
photomask templates and finally creating the high resolution patterns
directly on wafers through a 1X nanoimprint process. The ultrahigh
resolution of the JBX-6300FS makes it capable of writing sub-ten
nanometer linewidths onto photomasks. JEOL's JBX Gaussian Beam products
allow chip manufacturers to research and develop their processes into
the next several nodes. While optical lithography is still the de-facto
standard, e-beam lithography of critical layers or "mix and match"
lithography allow customers to pursue their next generation without the
associated cost of a next generation optical lithography tool.
Applications:
The new JBX-6300FS is a flexible tool for both direct write and
photomask development. It is one of two systems that JEOL offers for
this application. The JBX-9300FS is a high volume direct write e-beam
lithography tool designed for patterning wafers up to 300mm in
diameter.
Platform: The JBX-6300FS is
equipped with a thermal field emission electron gun with a ZrO/W
emitter, is an electron beam lithography system provided with the
Vector Scan Method for beam deflection. The beam deflection employs
19bit DAC, and the accelerating voltage 25kV or 50kV or 100kV is
selectable. An auto-loader is provided for continuous unattended
operation of up to ten cassettes The operation system of the computer
for lithography control and JOB making are done in UNIX.
Availability: May 2006 onwards.