Online information source for semiconductor professionals

New Product: Hach Ultra‚??s ORBISPHERE 510 enables precise process monitoring

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

HachProduct Briefing Outline: Hach Ultra has introduced its ORBISPHERE 510 instrument with the capability of connecting TC sensors for process control monitoring. The instrument offers multi channel capability for both thermal conductivity sensors measuring H2 or N2 and for electrochemical sensors measuring O2. This complete system is designed for process monitoring in liquid or gas phases across a wide range of applications for the electronics industry.

Problem: Improved accuracy coupled with fast response time is a key process control attribute for advanced semiconductor processing.

Solution: Up to 3 sensors using electrochemical or thermal conductivity technologies reduces cost of installation and ownership, according to the company. A high level of accuracy, rapid response time and selective gas measurement are claimed to give reliable and effective process monitoring. Software is accessible through a full color touch-screen allowing easy configuration of the instrument for process parameters and alarms. The main window displays real time process readings, graphed sensor trends, alarm limits, temperature and event occurrence.

Applications: This complete system is designed for process monitoring in liquid or gas phases across a wide range of applications.

Platform: To assist with process investigations, data can be easily transferred using one of the digital communication standard protocols such as RS 485, Ethernet, USB or Profibus DP in addition to traditional analog outputs. The ORBISPHERE 510 provides efficient 3-in-1 process monitoring, process efficiency and minimized total cost of operation, according to the company.

Availability: May 2007 onwards.

Hach

Related articles

New Product: Hach Ultra‚??s MET ONE 6000 offers continuous particle monitoring - 15 May 2008

Tool Order: leading-edge IC manufacturing places multiple system order with Nanometrics - 20 August 2009

New Product: Closed-loop digital ionization sensor from MKS Instruments handles static issues in EFE - 01 March 2007

Tool Order: two leading IC manufacturers select Qcept’s non-visual defect inspection system - 28 March 2011

Developing micro ADI methodology for new litho process monitoring strategies - 01 December 2007

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: