Online information source for semiconductor professionals

Product Briefing Outline: MKS Instruments has developed the ‘LIQUOZON' LoopO3 fully integrated ozonated water delivery system. The system is designed to be an environmentally friendly and cost-effective alternative to existing semiconductor cleaning technologies, especially in low flow applications. The system is compact and stand-alone and features fast cycle times and up to 12 L/min of DIO3 at ozone concentrations to 40/75 ppm, ideal specifications for single wafer applications, according to the company.

Problem: Ozone is an environmentally friendly alternative to many process chemicals used in wafer processing such as sulfuric acid. It has a high redox potential, can be generated at the point-of-use, and cost of purchase, storage and disposal of many different chemicals can be reduced.

Solution: The new, compact LoopO3 series was especially designed for low flow applications with ozone concentrations up to 75 ppm such as wet wafer cleaning, contaminant removal, surface conditioning, water marks removal and oxide growth. The system has an integrated recirculation pump which allows zero UPW consumption during IDLE mode and a very fast concentration control. Constant ozone concentration and operating pressure at varying flow rates provide process repeatability. Point-of-use DIO3 generation and the ease of conversion of ozone back to oxygen result in greatly reduced costs for the purchase, storage and disposal of cleaning chemicals.

Applications: Single wafer cleaning and processing tools for applications such as organic clean, water mark removal and oxide growth.

Platform: Based on the LIQUOZON 100/XF technology and incorporating SEMOZON® AX8407 technology, the LIQUOZON LoopO3 features closed-loop concentration control and DI water recirculation for fast response to changing flow requirements and significant water savings, according to the company. It has a claimed MTBF > 20,000 hours.

Availability: July 2006 onwards.