Online information source for semiconductor professionals

New Product: AE‚??s Paramount RF-power delivery system has network analyzer type accuracy

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

Advanced EnergyProduct Briefing Outline: Advanced Energy Industries has introduced its latest power platform: the ‘Paramount' RF-power delivery system. A key aspect of the new platform is power-delivery accuracy and control for increasingly complex film stacks and fine feature sizes. The 3kW Paramount system is well suited for both etch and deposition processes in semiconductor, FPD, MEMS and solar photovoltaic manufacturing.

Problem: Next-generation device fabrication processes feature anti-reflective coatings, hard masks, cap layers and stop layers in their recipes. Process designers must account for these layers while at the same time accurately etch or deposit the primary layer that may comprise multiple compositions and doping profiles.

Solution: The Paramount platform has been engineered to accommodates these complexities with ultra-accurate power control and delivery across the full output range - both on and off 50 ohm - for seamless process transitions in etch, strip, PECVD, HDP-CVD, PVD and PEALD. Where pulsing is required to enable next-generation process steps, the Paramount system's optional pulse and pulse synchronization features offer the widest pulse-frequency range available, according to the company. The system is able to keep pace - in real time - with the most abrupt plasma-impedance changes, and therefore enables faster transitions, shorter process steps and reduced process times. Optional frequency tuning is performed virtually instantaneously (within msec) -  faster than for any other product on the market.

Applications: Etch, strip, PECVD, HDP-CVD, PVD and PEALD.

Platform: This half-rack, 3kW RF power supply's impedance measurement is claimed to rival the accuracy of a network analyzer, enabling improved power delivery accuracy and control at 13.56 MHz fixed or variable frequencies. It is claimed to have accuracy, repeatability and process control for 50 ohm and non-50 ohm loads.

Availability: July 2007 onwards.

Related articles

New Product: Ultrapure water lab level analysis for production applications - 14 June 2006

New Product: Norcimbus‚?? NBlend variable flow gas mixing system saves significant material loss - 20 July 2009

Oki Electric reveals fully depleted SOI process with reverse polarity - 06 October 2005

in-line metrology and control of gas mixtures in semiconductor processing applications - 01 December 2005

New Product: MKS cuts MFC requirements for SDS implant operations with new low pressure PiMFC - 06 November 2006

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: