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Product Briefings

New Product: Line edge roughness reduction at 45nm on Applied’s Producer APF-e system

15 September 2006 | Wafer Processing
AMATProduct Briefing Outline: Applied Materials has introduced the Applied ‘Producer' ‘APF-e' system for depositing advanced patterning films in less than or equal to 70nm Flash and DRAM memory devices and less than or equal to 45nm Logic applications. According to the company this is a key enhancement to its first-generation APF film providing for greater optical transparency to deliver precise lithographic alignment in thicker (greater than 2,000A) hardmask layers. The APF-e film's are intended to be seen as a cost-effective hardmask technology featuring high selectivity to polysilicon and oxide to enable the key etch patterning steps required for continued geometric scaling Read more >>

New Product: High precision substrate-thickness metrology system launched by ISIS sentronics

12 September 2006 | Materials and Gases
ISISProduct briefing outline: ISIS sentronics has launched the SemDex 300 series wafer metrology system, that is designed to provide user defined thickness maps of substrates or other (multiple-) layers (for e.g. SOI) at repeatable rates down to 50nm. A wide range of materials including silicon, GaN, GaAs, SiC, Glass, Potoresist etc...can be evaluated, ranging from minimum 3-5µm up to about 1000µm. Other features such as bow/ warp, flatness, and wafer stress are also performed as well as surfacing profiling for mini-bumps can be achieved by exchanging the sensor head. Read more >>

New Product: Nova offers 2D/3D modeling on high throughput NovaScan 3090Next platform

29 August 2006 | Wafer Processing
NovaProduct Briefing Outline: Nova Measuring Instruments has launched the next generation of its NovaScan metrology systems, the ‘NovaScan 3090Next' series. The stand-alone metrology system provides improved topography modeling, faster throughput and excellent matching between tools and fabs, according to the company. This is done through implementation of polarized normal-incidence spectroscopic scatterometry, with an extended ultraviolet and infrared spectral range, for measuring the thickness and topography of thin films widely used in semiconductor manufacturing. Read more >>

New Product: Enhanced ferrofluid magnetic liquids from Ferrotec boost critical sealing applications

29 August 2006 | Critical Components
FerrotecProduct Briefing Outline: Ferrotec Corporation has made improvements to the standard ferrofluid magnetic liquids which provide the core sealing function in Ferrotec's ‘Ferrofluidic' vacuum rotary feedthroughs. Ferrotec vacuum feedthroughs are used in semiconductor manufacturing equipment, vacuum chambers, and other clean and controlled process environments. Ferrotec claims the new liquid improvements have reduced operating torque, reduced vapor pressure, and provided better thermal stability in demanding process environments. Read more >>

New Product: Electrical DFM issues handled by Blaze DFM’s optimization software

29 August 2006 | Lithography
Blaze DFMProduct Briefing Outline: Blaze DFM, has announced the Release 1.1 update to ‘Blaze MO' optimization software, the company's "Electrical DFM" solution. In electrical DFM, "design requirements" explicitly refers to timing and power (electrical) requirements, not just geometric information. Bringing design requirements forward into manufacturing means using the actual timing and power constraints supplied by the design team to drive what happens in manufacturing. Typically, this is done by interfacing with the resolution enhancement technology (RET) process in manufacturing. Read more >>

New Product: BlueShift Technologies offers innovative linear vacuum wafer handling system

29 August 2006 | Critical Components
BlueShift TechnologiesProduct Briefing Outline: BlueShift Technologies has announced the release of ‘QuickLink', a novel, linkable and adaptable wafer handling system. The system architecture is targeted at small-lot manufacturing and is currently configured for wafers up to 300mm but is easily scalable to 450mm, BlueShift have stated. QuickLink is designed to provide improved vacuum-process isolation, reduced wafer-to-wafer cross-contamination, minimal risk of wafer thermal stressing, and excellent low-particulate performance, according to the company. Read more >>

New Product: Advance lithography lens analysis and correction software from Litel Instruments boosts

29 August 2006 | Lithography
 Litel InstrumentsProduct Briefing Outline: Litel Instruments, has released of two new products designed to increase silicon chip performance and yield in leading edge semiconductor factories. The new products, dubbed ‘Distortion Mapper' (DMAP) and ‘Transmission Mapper' (TMAP), are used for analyzing and optimizing lens and illumination performance of photolithography tools. Read more >>

New Product: ULVAC Technologies cuts cost of resist strip processes with Enviro ‘Optima’s small

29 August 2006 | Wafer Processing
UlvacProduct Briefing Outline: ULVAC Technologies has launched the Enviro ‘Optima' Resist Strip System that the company claims has the smallest 300mm resist strip system footprint and thus provides the highest throughput per square meter of cleanroom space at the lowest cost. Read more >>

New Product: Compact LIQUOZON’ LoopO3 from MKS designed for single wafer cleaning tools

29 August 2006 | Materials and Gases
MKSProduct Briefing Outline: MKS Instruments has developed the ‘LIQUOZON' LoopO3 fully integrated ozonated water delivery system. The system is designed to be an environmentally friendly and cost-effective alternative to existing semiconductor cleaning technologies, especially in low flow applications. The system is compact and stand-alone and features fast cycle times and up to 12 L/min of DIO3 at ozone concentrations to 40/75 ppm, ideal specifications for single wafer applications, according to the company. Read more >>

New Product: New DFM suite from Synopsys aims to shorten correction, correlation & completion tasks.

23 August 2006 | Lithography
Product Briefing Outline: Synopsys has launched its PrimeYield tool suite that is designed to integrate design with manufacturing by accurately predicting design-induced mechanisms that threaten manufacturing tolerances and by providing automated correction guidance to upstream design implementation tools. PrimeYield provides predictive and corrective actions for manufacturing-sensitive design patterns before tapeout, according to the company. This is due to using production-baseline technology and manufacturing models by the leading foundries and integrated device manufacturers (IDMs). Synopsys reports that PrimeYield can reduce time to yield by 4 to 6 weeks at advanced nodes. Read more >>