Online information source for semiconductor professionals

Product Briefing Outline: Applied Materials, has launched ‘NeXus SPC' its next generation advanced process control software and hardware, used exclusively on a range of Applied's 300mm process tools. The new diagnostic tool performs split-second analysis of process conditions which is critical information that can increase system uptime and yield, protect wafers from process drift and enable more cost-effective maintenance schedules. Currently, Applied customers employ the NeXus platform on more than 350 of its process systems worldwide. Read more >>

Product Briefing Outline: Entrepix' has launched its CMP ‘FastForward' foundry service that the company claims is the most extensive portfolio of CMP (chemical mechanical processing) processes, foundry services and equipment offerings to meet the semiconductor industry's rapidly growing interest in the Fab-Light manufacturing model. Read more >>

Product Briefing Outline: PI has introduced the world's first PCI-bus digital nano-positioning controller for closed-loop piezoelectric positioners & scanners. The new E-761 motion controller is designed to provide more flexibility and better overall value than any other digital piezo controller on the market today, according to the company. Read more >>

Product Briefing Outline: Ansell Healthcare has produced a new ‘ChemTek' glove that is designed to provide the highest level of protection for handling hazardous chemicals in manufacturing and chemical processing environments. The new ChemTek product line is comprised of two different glove styles that offers chemical protection for first responders and others who may be faced with potentially hazardous or unknown substances. Read more >>

Product Briefing Outline: GE Analytical Instruments has introduced the Sievers 500 RL On-Line Total Organic Carbon (TOC) Analyzer. The reagentless analyzer is designed for continuous monitoring of organics in ultrapure water (UPW) for pharmaceutical, microelectronics, and power applications with a 0.03 ppb limit of detection and autozero capabilities, according to the company. Read more >>

Product Briefing Outline: Metara has introduced the ‘SENTRY' Harsh Chemistry Metrology (HCM) system that the company claims is the first of its kind to be able in fully automated mode to analyze harsh ultra-pure chemicals for metallic contamination excursions. Read more >>

Product Briefing Outline: Rudolph Technologies, has launched both the ‘S3000' and ‘S2000' ellipsometry-based metrology systems designed to provide high throughput, cost-effective measurements of thin transparent films in volume production environments. Read more >>

Product Briefing Outline: AP&S GmbH has launched its 2006 ‘MultiStep' automated wet bench. The platform, covers all applications for wet etching, layer thinning, surface cleaning and layer stripping of various materials and is claimed to offer a small footprint coupled to user-friendliness and reliability. Read more >>

Product Briefing Outline: JEOL, has introduced a new high precision direct write e-beam lithography system. The new JBX-6300FS is a spot beam, vector scan, step and repeat lithography system designed for high volume direct patterning on wafers, and is capable of writing minimum line widths of 8nm, according to the company. 2-inch to 200mm wafers can be accommodated, as well as parts and pieces. An autoloader allows continuous unattended operation of up to 10 cassettes under vacuum. Read more >>

Product Briefing Outline: Mallinckrodt Baker has introduced its ‘ALEG-380' photoresist stripper and residue remover as a cost-effective alternative to hydroxylamine-based chemistries in aluminum IC manufacturing processes. ALEG-380 is 100% water-soluble formulation that does not require an intermediate rinse, helping fabs improve yields and reduce manufacturing costs. Read more >>