Product Briefing Outline: Ansell Healthcare has
produced a new ‘ChemTek' glove that is designed to provide the highest
level of protection for handling hazardous chemicals in manufacturing
and chemical processing environments. The new ChemTek product line is
comprised of two different glove styles that offers chemical protection
for first responders and others who may be faced with potentially
hazardous or unknown substances.
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Product Briefing Outline: GE Analytical Instruments
has introduced the Sievers 500 RL On-Line Total Organic Carbon (TOC)
Analyzer. The reagentless analyzer is designed for continuous
monitoring of organics in ultrapure water (UPW) for pharmaceutical,
microelectronics, and power applications with a 0.03 ppb limit of
detection and autozero capabilities, according to the company.
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Product Briefing Outline: Metara has introduced the
‘SENTRY' Harsh Chemistry Metrology (HCM) system that the company claims
is the first of its kind to be able in fully automated mode to analyze
harsh ultra-pure chemicals for metallic contamination excursions.
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Product Briefing Outline: Rudolph Technologies, has
launched both the ‘S3000' and ‘S2000' ellipsometry-based metrology
systems designed to provide high throughput, cost-effective
measurements of thin transparent films in volume production
environments.
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Product Briefing Outline: AP&S GmbH has launched
its 2006 ‘MultiStep' automated wet bench. The platform, covers all
applications for wet etching, layer thinning, surface cleaning and
layer stripping of various materials and is claimed to offer a small
footprint coupled to user-friendliness and reliability.
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Product Briefing Outline: JEOL, has introduced a new
high precision direct write e-beam lithography system. The new
JBX-6300FS is a spot beam, vector scan, step and repeat lithography
system designed for high volume direct patterning on wafers, and is
capable of writing minimum line widths of 8nm, according to the
company. 2-inch to 200mm wafers can be accommodated, as well as parts
and pieces. An autoloader allows continuous unattended operation of up
to 10 cassettes under vacuum.
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Product Briefing Outline: Mallinckrodt Baker has
introduced its ‘ALEG-380' photoresist stripper and residue remover as a
cost-effective alternative to hydroxylamine-based chemistries in
aluminum IC manufacturing processes. ALEG-380 is 100% water-soluble
formulation that does not require an intermediate rinse, helping fabs
improve yields and reduce manufacturing costs.
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Product Briefing Outline: Unotron has produced a range
of keyboards and mice that are compatible with cleanroom environments
and can be repeatedly immerse cleaned to control particulates. Under
the ‘SpillSeal' technology label, the Unotron keyboard and peripherals
meet NEMA4/IP 66 specifications while offering performance standards
expected for daily use, according to the company.
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Product Briefing Outline: SII Nano Technology has
launched "SmartMRC" mask rule checker software package that is designed
to be used for mask data verification as part of the requirement for
manufacturing and inspection of advanced photomasks. SmartMRC was
jointly developed with Dai Nippon Printing Co., Ltd. and will be
available from April 2006.
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Product Briefing Outline: Picarro, a manufacturer of
high performance lasers and laser-based instruments, has begun
commercial shipments of its next generation ammonia measurement
instrument. The instrument, the ESP-1000, is based on Picarro's
patented Cavity Ring Down Spectroscopy (CRDS) and achieves better than
1 part-per billion detection of ammonia in ambient air, according to
the company.
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