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Materials & Gases Product Briefs
New Product: Levitronix’s ‘BPS 600’ maglev pumps eliminate CMP slurry particle agglomeration Print E-mail
May 14, 2008 at 12:58 PM

ImageProduct Briefing Outline: Levitronix has introduced the new ‘BPS 600’ magnetically levitated pump technology, designed for demanding applications in the semiconductor industry such as CMP slurry delivery, copper electroplating and wafer cleaning at leading-edge process nodes. The patented impeller floats in a magnetic field only touching the fluid it is pumping, and can be fully integrated into a fully-closed loop electronic control system without the need of additional controller hardware. 

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New Product: Edwards’ iXH vacuum pump series handles sub-60nm harsh process environments Print E-mail
May 14, 2008 at 10:38 AM

ImageProduct Briefing Outline: Edwards has introduced the new iXH series of vacuum pumps, used for harsh process environments. Designed to meet the increasing demands of the emerging processes required for semiconductor manufacturing at 60nm and smaller design rules, the iXH is designed to help reduce tool cost-of-ownership (CoO) with a smaller footprint than previous generations, and also features a modular design that enables a quicker response to emerging process requirements. 

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New Product: VisionPad 5000 from Rohm and Haas reduces CMP scratch and chatter marks Print E-mail
Jan 31, 2008 at 05:10 PM

ImageProduct Briefing Outline: Rohm and Haas Electronic Materials’ CMPTechnologies division has introduced the ‘VisionPad’ 5000 CMP pad, specifically designed for defectivity reduction in shallow trench isolation (STI) and interlayer dielectric (ILD) applications. The new pad targets volume manufacturing of memory and logic chips at 65nm and below. 

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New Product: Post etch residue remover from Applied Chemical Laboratories cuts time and costs Print E-mail
Dec 07, 2007 at 04:14 PM
ACL-585 Product Briefing Outline: Applied Chemical Laboratories has introduced ‘ACL-585 HiPER-Solv’ (patents pending), a high performance etch residue solvent that is claimed to realize a significant improvement in removal of post-etch hardened polymers and polymer residue from metal and via etch processes when compared with conventional hydroxylamine or solvent-amine products. ACL-585 is specifically formulated for advanced sub-90 nm design rules that incorporate high density plasma etch. The solvent is new non-corrosive and environmentally benign.Write Comment (0 comments)
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New Product: Tiger Optics’ new HALO+ CRDS analyzer covers widest dynamic range Print E-mail
Sep 06, 2007 at 04:18 PM
ImageProduct Briefing Outline: Tiger Optics has recently unveiled the HALO+, a mini-Cavity Ring-Down Spectroscopy (CRDS) analyzer capable of measuring moisture from 200 parts-per-trillion to 20 parts-per-million levels. It offers similar dynamic range for other detections as well.  An evolution of the compact HALO analyzer, the new HALO+ is equally small, but offers greater sensitivity, and communication, analysis, and trending capabilities comparable to Tiger's flagship LaserTrace and MTO analyzers.

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New Product: Cabot develops highly tunable B6600 barrier slurry for advanced Cu/low-k Print E-mail
Aug 21, 2007 at 04:04 PM
B6600Product Briefing Outline: Cabot Microelectronics has claimed a major breakthrough in its CMP technology with improvements to its B6600 platform of barrier CMP slurries for advanced technology nodes. B6600 barrier slurry platform is tunable, enabling the products to be easily customized to deliver improved planarity and defect performance across a wide range of integration schemes. The B6600 barrier slurry products are being produced and used worldwide for technology nodes from 90nm through 45nm, according to the company.Write Comment (0 comments)
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New Product: ORION Helium ion microscope from Carl Zeiss SMT breaks new ground in microscopy Print E-mail
Aug 15, 2007 at 02:40 PM
ORIONProduct Briefing Outline: Carl Zeiss SMT has officially launched the ‘ORION' Helium ion microscope based on proprietary intellectual property developed by ALIS Corporation, a Peabody, Massachusetts-based start-up company acquired by Carl Zeiss SMT in 2006. According to Carl Zeiss SMT, this new microscope is capable of providing images of unrivalled high resolution, surface information and material contrast, unachievable with any other microscopy instrument available today.Write Comment (0 comments)
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New Product: Ferro’s new ILD slurry eliminates reverse mask etch-back steps Print E-mail
Jul 05, 2007 at 02:48 PM
ImageProduct Briefing Outline: Ferro Electronic Material Systems has introduced a patent-pending self-stopping chemical mechanical planarization (CMP) slurry for Inner Layer Dielectric (ILD) materials. Ferro claims the new slurry provides planarization efficiency of > 95% with an increased over-polish window and eliminates the need for endpoint detection.  ‘SureStop' 8500 offers improved efficiency and uniformity with lower defectivity compared to standard ILD CMP slurries and is now being used to simplify planarization processes that employ reverse mask etchback steps.

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New Product: Ferro’s new formulated ceria slurry targets 65nm STI processes Print E-mail
Jun 22, 2007 at 10:04 AM
ImageProduct Briefing Outline: Ferro Electronic Material Systems has formulated patented high selectivity shallow trench isolation (STI) CMP slurries with an optimized low defectivity ceria particle that enable high-yield processes for next-generation devices.  ‘TruPlane™ 8272' is performing successfully in high-volume manufacturing of 65nm technology Flash devices, according to the company.

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New Product: New tungsten slurries from Cabot combat edge-over-erosion Print E-mail
Jun 18, 2007 at 09:39 AM
ImageProduct Briefing Outline: Cabot Microelectronics has claimed a major breakthrough in its CMP technology with the ‘WIN' platform of tungsten (W) CMP slurries for advanced technology nodes. The WIN product line is non-hazardous and environmentally friendly as it is based on hydrogen peroxide technology. The product platform is composed of two main product classes: ‘WIN W7000' and ‘WIN W7300.'

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