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Silicon revenues declined 41% in 2009: Shipments down 18%

15 February 2010 | Materials and Gases
Worldwide silicon wafer area shipments hit rock bottom in the first quarter of 2009, but a strong recovery was noted in each subsequent quarter of 2009, according to new figures from the SEMI Silicon Manufacturers Group (SMG). Shipments decreased by 18% in 2009 when compared to 2008 area shipments. Read more >>

Dow Electronic Materials joins SEMATECH’s development of EUV resists

11 February 2010 | Lithography
Dow Electronic Materials has partnered with SEMATECH’s Resist Materials and Development Center at UAlbany NanoCollege, Albany, NY to advance the development of next-generation extreme ultra-violet lithography (EUVL) materials and resists for use at the 22nm node and beyond. Read more >>

Ultrapure steam system maker Rasirc signs exclusive U.S. distribution deal with Matheson Tri-Gas

11 February 2010 | Wafer Processing
Matheson Tri-Gas and Rasirc have signed an exclusive distributor agreement, in which the gas company will distribute the equipment manufacturer's purification and delivery systems for controlled humidification and ultrapure steam generation for solar and microelectronics applications throughout the United States. Read more >>

Rite Track extends availability of parts for SVG 9X tracks

11 February 2010 | Lithography
90-S Series SVG tracksThe purchase of 90-S Series SVG tracks from the closed NXP Fishkill fab has meant that Rite Track can now offer a continued line of replacement parts for the platform. Integration of this inventory began late last year and is now available to Rite Track customers, apparently with significant savings, according to the company. Read more >>

Tool Order: Axcelis wins follow-on order for Optima HDx

11 February 2010 | Wafer Processing
A leading chip manufacturer has placed a follow-on order with Axcelis Technologies for its Optima HDx high current implanter. Axcelis said that the customer had used the system in another fab and would now expand its adoption of the tool at its newest facility. Read more >>

Novellus joins IBM and CNSE on resist strip process development

11 February 2010 | Wafer Processing
The GxT and G400 are photoresist strip systems A new technology development collaboration has been established between Novellus Systems, IBM and the College of Nanoscale Science and Engineering (CNSE) at CNSE’s Albany NanoTech Complex to develop advanced, residue-free photoresist strip technologies for leading-edge processes for the 28nm and 22nm nodes.
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Micron claims title of second largest memory producer following Numonyx acquisition

11 February 2010 | Fab Management
In the acquisition of primarily NOR flash manufacturer Numonyx, which was a joint venture between Intel Corporation, STMicroelectronics and Francisco Partners, Micron Technology’s, Chairman and CEO Steve Appleton noted in a conference call that the newly combined organization would have the second-largest share of the memory market after Samsung. Appleton claimed that it would 19% share, with Samsung holding 29% and slightly more that 17% share noted for Hynix, which has been the longstanding number 2 in the market. Privately held Numonyx was acquired by Micron, via an all-stock transaction valuing Numonyx at approximately US$1.27 billion. Read more >>

Tool Order: Hamamatsu Photonics selects NIL system from Obducat

09 February 2010 | Lithography
Hamamatsu Photonics has placed an order for an Obducat NIL system through its sales partner in Japan, Canon Marketing Japan. The NIL system will be used in product development and pilot production of new optical devices. Obducat said that Hamamatsu based their selection on imprint quality, the industrial track record of Obducat and the strong local support from Canon. Read more >>

ASML joins SEMATECH’s EUV lithography program

09 February 2010 | Lithography
ASML has joined SEMATECH’s Lithography program at the College of  Nanoscale Science and Engineering’s (CNSE) Albany NanoTech Complex to further develop EUV lithography to ensure its future adoption. ASML already partners with IMEC on EUV technology and infrastructure development. CNSE also has an ASML built EUV ‘Alpha’ tool. Read more >>

VLSI Research awards Oerlikon Systems a Five Star customer satisfaction rating

09 February 2010 | Fab Management
VLSI Research has awarded Oerlikon Systems a ‘five star rating’ for customer satisfaction in 2009. The five star ratings are handed out by chip equipment users (representing 95% of the world’s semiconductor market) and compiled by VLSI Research as part of their 2009 Customer Satisfaction Report. Read more >>