Online information source for semiconductor professionals

At the upcoming Design Automation Conference (DAC) in San Diego California, TSMC is to showcase its 20nm node ‘Transparent Double Patterning’ design solution for the first time, which is a key part of the on-going build up of 20nm design capability within the Open Innovation Platform. The foundry is also detailing Reference Flow 12.0, which features various enhancements for the 28nm node. Read more >>

Photoresist supplier, Fujifilm is joining SEMATECH’s Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany to collaborate on critical resist issues in extreme ultraviolet (EUV) lithography. SEMATECH’s RMDC will provide access to two micro-exposure tools (METs) as well as several metrology tools for Fujifilm’s photoresist development work. Read more >>

A perennial participant in a number of customer based supplier awards, Toppan Photomask has bagged another for ‘Outstanding Service in 2010,’ this time with Singapore-based JV foundry, Silicon Manufacturing Company Pte Ltd. (SSMC). According to the mask supplier, SSMC won the award based on metrics in technology, support, quality, responsiveness, commitment, logistics and price. Toppan also received bonus points for supporting SSMC in meeting aggressive project timelines for new product introductions. Read more >>

A single order worth approximately US$74.6 million has been placed by DRAM memory manufacturer, Inotera Memories with lithography equipment supplier ASML. The deal follows-on from a recent US$23.2 million tool order with the Dutch firm. Read more >>

Major orders placed with Cymer in the second half of 2010 have begun to translate into an increased level of lithography light source shipments in the first quarter of 2011 as the company shipped 50 light sources in the first quarter of 2011. Revenue totalled US$154.4 million compared to revenue of US$113.8 million in the first quarter of 2010, and revenue of US$146.9 million in the fourth quarter of 2010. Read more >>

With DRAM manufacturer, Inotera migrating technology to Micron’s stack DDR 3 50nm process, the Taiwan-based firm has already been active this year in purchasing a range of new processing equipment. However, the latest purchase order is for lithography tools to be supplied by ASML at a cost of US$23.2 million. Read more >>

Having recently places a lithography equipment order with rival Nikon, worth approximately, US$23.4 million, Taiwan-based IC foundry, UMC has placed a new order with ASML worth around US$51 million. The order was a single not cumulative batch of orders. Read more >>

Taiwan foundry, UMC has placed a single order with Nikon worth approximately US$23.4 million. The order is believed to be for a single advanced lithography system for a 300mm fab, based in Taiwan. Read more >>

A series of orders worth approximately US$80.2 million have been placed with lithography equipment leader, ASML by leading foundry, TSMC, according to stock market filings. ASML has been TSMC’s main lithography equipment supplier since inception.
Read more >>

The first 100kV lithography system in Greece is to be supplied by Vistec Lithography to the National Center for Scientific Research (NCSR Demokritos). The nanotechnology centre purchased an EBPG5000plusES system for one of its associated Institutes, IMEL (Installed at the Institute of Microelectronics). Read more >>