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With DRAM manufacturer, Inotera migrating technology to Micron’s stack DDR 3 50nm process, the Taiwan-based firm has already been active this year in purchasing a range of new processing equipment. However, the latest purchase order is for lithography tools to be supplied by ASML at a cost of US$23.2 million. Read more >>

Having recently places a lithography equipment order with rival Nikon, worth approximately, US$23.4 million, Taiwan-based IC foundry, UMC has placed a new order with ASML worth around US$51 million. The order was a single not cumulative batch of orders. Read more >>

Taiwan foundry, UMC has placed a single order with Nikon worth approximately US$23.4 million. The order is believed to be for a single advanced lithography system for a 300mm fab, based in Taiwan. Read more >>

A series of orders worth approximately US$80.2 million have been placed with lithography equipment leader, ASML by leading foundry, TSMC, according to stock market filings. ASML has been TSMC’s main lithography equipment supplier since inception.
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The first 100kV lithography system in Greece is to be supplied by Vistec Lithography to the National Center for Scientific Research (NCSR Demokritos). The nanotechnology centre purchased an EBPG5000plusES system for one of its associated Institutes, IMEL (Installed at the Institute of Microelectronics). Read more >>

Senior lithography experts at Intel talking at the 2011 SPIE Advanced Lithography conference  may have valid concerns over the readiness of EUV lithography to enter volume production at the 10nm node, but another Intel guru presented at SEMI organised ISS Europe earlier this week was not so concerned. Read more >>

The eBeam Initiative has highlighted that several of its members will present the latest breakthroughs in DFEB mask and direct write technology at the Annual SPIE Advanced Lithography Symposium 2011. The eBeam Initiative also announced that four additional companies have joined its ranks. These new members—Artwork Conversion, Grenon Consulting, NCS and Xilinx—strengthen the ecosystem that is critical to supporting the commercialization of DFEB technology. Read more >>

Building the infrastructure for EUV has been costly and thwart with technical challenges of the last few years. At this year’s SPIE Advanced Lithography conference, SEMATECH is using a series of technical paper presentations to report the current progress on EUV. Read more >>

ETH Zurich has ordered an electron-beam lithography tool from Vistec Lithography. The Vistec EBPG5200 will be installed in a new Nanotechnology Center, which has been established in partnership between IBM Research – Zurich and ETH Zurich. The tool will be used for exploratory research aiming at nanotechnology applications such as MEMS/NEMS, nanowires and carbon-based devices, amongst others. Read more >>

Cymer reported its seventh consecutive quarter of revenue growth with fourth quarter revenue US$146.9 million compared to revenue of US$96.4 million in the fourth quarter of 2009, and revenue of US$141.7 million in the third quarter of 2010. Cymer said that revenue for the full year reached US$534.2 million compared to revenue of US$307.7 million in 2009. Read more >>