
DUV light source orders have waned in the second quarter as IC
manufacturers pause on capital expenditure plans going into 2011,
according to comments made by Cymer in reporting quarterly results last
week. Light source shipments in 2Q, totalled 47 light sources, of which
28 were ArF immersion, 17 were KrF and 2 were ArF dry, and the company
installed 56 light sources at chipmaker and other end user locations.
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Billed as an important milestone in imec’s ‘Advanced Lithography’
program, the research centre has successfully printed wafers using the
new pre-production EUV scanner from ASML. The system also employs a
laser assisted discharge plasma (LDP) source from XTREME technologies
and is interfaced with a TEL Lithius Pro EUV process track. According to
imec, ASML’s NXE:3100, is currently the only pre-production tool in the
world equipped with an LDP source from XTREME technologies. The EUV tool is
reported to cost approximatley €42 million.
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ASML reported record quarterly revenue for the second quarter of 2011.
Sales were €1.529 billion, compared to €1,452 billion in the previous
quarter. ASML shipped 63 systems shipped valued at €1.333 billion.
Service and field option sales were at €196 million in the quarter.
Order backlog were reported at €2.756 billion, made up of 105 systems
with an ASP of €26.2 million. ASML expects net sales to be lower than analysts had expected for the
third quarter. The lithography supplier guided sales of €1.4 billion,
including two second generation EUV systems which represent total sales
of around €80 million with zero profit margin. ASML reiterated that its sales expectation for 2011 would hit a record of over €5 billion, not including EUV.
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Considering its pre-production NXT:3100 EUV lithography tool was thought to carry a price tag above €50 million a pop, while having a throughput in the single digit wafer per hour range, ASML's production tool; NXE:3100 looks a bit of bargain at an ASP of €42 million, given the projected throughput of 60wph.
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SUSS MicroTec is to ship the first MaskTrack Pro InSync - the first
holistic in-fab EUVL mask management offering to imec in Belgium, in
August 2011. MTP InSync is a stand-alone or clustered handling system
which seamlessly synchronizes mask cleaning, handling, inspection and
storage in a single controlled environment.
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Advanced semiconductor manufacturers, Intel, Globalfoundries, Samsung
Electronics and TSMC have joined SEMATECH’s EUVL Mask Infrastructure
partnership program, specifically to pursue what was described as an
‘ambitious metrology program’ to enable defect-free EUVL masks for
high-volume manufacturing. Defect-free masks and the ability of
metrology systems to detect the defects has been a major problem facing
the adoption of EUV lithography. A key metrology equipment supplier in
the project is Carl Zeiss.
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Lithography light source manufacturer, Gigaphoton claims that its debris
mitigating technology, using magnetic fields for laser-produced plasma
(LPP) light sources for EUV lithography is capable of removing 92% of
debris, which means the technology will enter mass production, and
shipments start in early, 2012.
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Lithography market leader, ASML has secured another batch of lithography
equipment orders from TSMC. The latest follow-on order is for the
amount of approximately US$58.77 million. ASML is TSMC’s preferred
supplier for lithography tools.
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According to a new report from technical-based market research firm,
Techcet photoresist manufacturer’s revenues are expected to continue to
grow at 4.7% over the next three years, fuelled by demand for 193nm
immersion with double patterning lithography, which is being driven by
NAND Flash memory manufacturers.
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Continued preferred supplier status at TSMC is benefiting leading
lithography supplier, ASML. Already a recipient of multiple major
purchase orders from the leading foundry, a new order issued by TSMC to
ASML is worth approximately US$117.6 million. The order is likely to be
the single largest from TSMC the lithography tool supplier has received
this year.
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