Online information source for semiconductor professionals

Advanced semiconductor manufacturers, Intel, Globalfoundries, Samsung Electronics and TSMC have joined SEMATECH’s EUVL Mask Infrastructure partnership program, specifically to pursue what was described as an ‘ambitious metrology program’ to enable defect-free EUVL masks for high-volume manufacturing. Defect-free masks and the ability of metrology systems to detect the defects has been a major problem facing the adoption of EUV lithography. A key metrology equipment supplier in the project is Carl Zeiss. Read more >>

Lithography light source manufacturer, Gigaphoton claims that its debris mitigating technology, using magnetic fields for laser-produced plasma (LPP) light sources for EUV lithography is capable of removing 92% of debris, which means the technology will enter mass production, and shipments start in early, 2012. Read more >>

Lithography market leader, ASML has secured another batch of lithography equipment orders from TSMC. The latest follow-on order is for the amount of approximately US$58.77 million. ASML is TSMC’s preferred supplier for lithography tools. Read more >>

According to a new report from technical-based market research firm, Techcet photoresist manufacturer’s revenues are expected to continue to grow at 4.7% over the next three years, fuelled by demand for 193nm immersion with double patterning lithography, which is being driven by NAND Flash memory manufacturers. Read more >>

Continued preferred supplier status at TSMC is benefiting leading lithography supplier, ASML. Already a recipient of multiple major purchase orders from the leading foundry, a new order issued by TSMC to ASML is worth approximately US$117.6 million. The order is likely to be the single largest from TSMC the lithography tool supplier has received this year. Read more >>

At the upcoming Design Automation Conference (DAC) in San Diego California, TSMC is to showcase its 20nm node ‘Transparent Double Patterning’ design solution for the first time, which is a key part of the on-going build up of 20nm design capability within the Open Innovation Platform. The foundry is also detailing Reference Flow 12.0, which features various enhancements for the 28nm node. Read more >>

Photoresist supplier, Fujifilm is joining SEMATECH’s Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany to collaborate on critical resist issues in extreme ultraviolet (EUV) lithography. SEMATECH’s RMDC will provide access to two micro-exposure tools (METs) as well as several metrology tools for Fujifilm’s photoresist development work. Read more >>

A perennial participant in a number of customer based supplier awards, Toppan Photomask has bagged another for ‘Outstanding Service in 2010,’ this time with Singapore-based JV foundry, Silicon Manufacturing Company Pte Ltd. (SSMC). According to the mask supplier, SSMC won the award based on metrics in technology, support, quality, responsiveness, commitment, logistics and price. Toppan also received bonus points for supporting SSMC in meeting aggressive project timelines for new product introductions. Read more >>

A single order worth approximately US$74.6 million has been placed by DRAM memory manufacturer, Inotera Memories with lithography equipment supplier ASML. The deal follows-on from a recent US$23.2 million tool order with the Dutch firm. Read more >>

Major orders placed with Cymer in the second half of 2010 have begun to translate into an increased level of lithography light source shipments in the first quarter of 2011 as the company shipped 50 light sources in the first quarter of 2011. Revenue totalled US$154.4 million compared to revenue of US$113.8 million in the first quarter of 2010, and revenue of US$146.9 million in the fourth quarter of 2010. Read more >>