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M+W Zander to build 200mm fab for ANGSTREM

27 June 2008 | Cleanroom
AngstremANGSTREM is to convert and existing fab to 200mm wafer production with the construction of support buildings and full conversion expected to be completed by the end of 2009. M+W Zander FE GmbH has been awarded the contract that is expected to cost approximately €150 million. Read more >>

Micron Technology increases capital spending through 2009

27 June 2008 | Cleanroom
MicronMark Durcan, President and Chief Operating Officer of Micron Technology said in a conference call with financial analysts covering its financial third quarter results that its capital spending for its fiscal 2008 would end up being on the high side of its previous guidance of between $2.5 billion and $3 billion. Read more >>

TSMC capital spending up for 2Q08

30 April 2008 | Cleanroom
TSMCTSMC has said that capital spending for 2008 will be approximately $1.8 billion, down from its revised final figure in 2007 of $2.6 billion, a 31 percent decrease year-on-year. Executives had previously stated that CapEx for 2008 would be significantly lower than the figure for 2007 but had not guided to specific levels. Read more >>

Fab utilization rates continue to climb at Chartered Semiconductor

25 April 2008 | Cleanroom

Chartered SemiconductorChartered Semiconductor’s overall fab utilization rates have climbed from 70 percent in 1Q07 to 86 percent in 1Q08 and are expected to top 88 percent in 2Q08, the company noted in its first quarter 2008 financial results.

 

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Micron and Nanya set up 300mm DRAM joint venture

21 April 2008 | Cleanroom

M. DuncanAs mentioned in Micron Technology’s most recent quarterly financial conference call, the deal with Nanya Technology on sub-50nm DRAM design and process technology - signed in March - has progressed to include a new 300mm DRAM manufacturing joint venture, dubbed MeiYa Technology Corporation. 

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NEHP upgrades to new facility

15 April 2008 | Cleanroom
NEHPProcess piping solutions provider NEHP, Inc. has moved its production facilities to a new 15,000 square-foot building in Williston, Vermont. With cleanrooms of class 1,000 and 10,000 and two demarcated fabrication and production areas in the building, the move also holds the promise of further expansion with permits for the addition of a further 10,000 square feet. Read more >>

Powerchip breaks ground on next two 300mm fabs

08 April 2008 | Cleanroom
PSCPowerchip Semiconductor Corporation (PSC) has officially broken ground on its next two 300mm fabs, dubbed P4 and P5, at an estimated combined cost of approximately $8.2 billion. Each fab will have a capacity of 60,000 wafer starts per month (wspm) when fully ramped. Read more >>

Micron delaying production start at Singapore NAND flash fab

03 April 2008 | Cleanroom
MicronMark Durcan, Micron Technology’s President and COO, said during a conference call with financial analysts that the company would be delaying the production start of its IMFT joint venture 300mm fab, currently under construction in Singapore. Read more >>

Hynix delays 300mm fab ramp

01 April 2008 | Cleanroom
HynixFollowing quickly on heels of news that Hynix Semiconductor would cut capital spending in the second half of 2008 by approximately $1 billion, the Korean memory manufacturer, as reported by Reuters, is to delay the production ramp of its newest 300mm fab, M11 by a quarter. M11 is a NAND flash memory fab. Read more >>

Spansion hits 25,000 wafer starts per quarter milestone at SP1

06 March 2008 | Cleanroom
SpansionSpansion has said that it has reached a ramp of 25,000 wafer starts per quarter at its 300mm fab (SP1) in Japan, producing 65nm MirrorBit NOR flash devices. Spansion is currently the only NOR flash memory manufacturer using 300mm wafers and migrating to the 65nm half-pitch node. Read more >>