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Vistec ships e-beam tool to Moscow Institute for photomask requirements

15 December 2009 | By Mark Osborne | News > Lithography

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Vistec Electron Beam has shipped a 50kV Variable Shaped Beam system for photomask production to the Moscow Institute of Electronic Technology (MIET). The e-beam system is equipped with a fully automated substrate handling and is prepared to expose different substrate types and sizes.

“After ramping up, the MIET Photomask Centre will provide both semiconductor industry as well as research institutes in Russia with advanced photomasks for a wide range of applications”, said Vladimir Bespalov, Senior Vice Rector of MIET Technical University. “Besides mask manufacturing, education and research will play a central role in the new Photomask Centre. MIET selected a Variable Shaped Beam system from Vistec because of the lithography performance, high flexibility, field proven reliability and ease of operation functionality of the system.”

“We are extremely proud to team-up with MIET in this photomask manufacturing project”, stated Wolfgang Dorl, General Manager of Vistec Electron Beam GmbH. “The recently shipped Variable Shaped Beam system represents a continuation of an outstanding business history the company has with Russia and opens up new and exciting opportunities in the growing Russian market.”
 

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