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Veeco‚??s 3D AFM tool starts EUVL resist reference work at SEMATECH

06 July 2009 | By Mark Osborne | News > Lithography

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SEMATECH has accepted Veeco Instruments' ‘InSight’ 3D Atomic Force Microscope for non-destructive reference metrology for critical dimension (CD), overlay and contour, as well as 3D characterization of EUVL resist features. SEMATECH’s Metrology Program is located at the College of Nanoscale Science and Engineering’s (CNSE) Albany NanoTech Complex.

“One of the greatest metrology concerns for the 32nm node and below is accuracy as it applies to CD and overlay measurements,” said John Allgair, SEMATECH Metrology Program Manager. “The InSight 3DAFM tool will address this concern and will be used as part of our overall CD metrology strategy to provide reference metrology for CD-SEMs and scatterometry. Additionally the InSight will be used to provide three-dimensional characterization of advanced EUVL resist structures.”

InSight’s non-destructive true profile metrology with TEM-level profile accuracy is said to allow lower development costs by replacing TEM cross-sections.

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