Online information source for semiconductor professionals

Veeco‚??s 3D AFM tool starts EUVL resist reference work at SEMATECH

06 July 2009 | By Mark Osborne | News > Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

SEMATECH has accepted Veeco Instruments' ‘InSight’ 3D Atomic Force Microscope for non-destructive reference metrology for critical dimension (CD), overlay and contour, as well as 3D characterization of EUVL resist features. SEMATECH’s Metrology Program is located at the College of Nanoscale Science and Engineering’s (CNSE) Albany NanoTech Complex.

“One of the greatest metrology concerns for the 32nm node and below is accuracy as it applies to CD and overlay measurements,” said John Allgair, SEMATECH Metrology Program Manager. “The InSight 3DAFM tool will address this concern and will be used as part of our overall CD metrology strategy to provide reference metrology for CD-SEMs and scatterometry. Additionally the InSight will be used to provide three-dimensional characterization of advanced EUVL resist structures.”

InSight’s non-destructive true profile metrology with TEM-level profile accuracy is said to allow lower development costs by replacing TEM cross-sections.

Related articles

Resist post processing allows EUV patterning at the 22nm node - 12 August 2008

TOK to develop EUV photoresists at SEMATECH - 29 April 2009

Dow Electronic Materials joins SEMATECH‚??s development of EUV resists - 11 February 2010

EUVL Symposium: source, mask defects & resists remain challenges - 15 October 2008

Breakthroughs abound, but when will EUVL be ready? - 29 October 2007

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: