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Tyndall National Institute chooses Cambridge NanoTech‚??s Plasma ALD system

22 July 2009 | By Emma Hughes | News > Wafer Processing

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Fiji Plasma ALD System Cambridge (Mass. US) NanoTech, leader in Atomic Layer Deposition (ALD) science and equipment has announced that Tyndall National Institute in Cork, Ireland has purchased the Fiji Plasma ALD System to enhance itsALD research capabilities.

The Fiji System delivers performance and versatility for both plasma and thermal ALD deposition. Its system design, including a dual chamber configuration, is customizable for maximum experimental efficiency.

The system also reduces operating costs and simplifies system maintenance with very low precursor consumption, fully integrated ALD Shield vapor trap, and off-the-shelf replacement costs.

Jeremy Davis, European Sales Director of Cambridge NanoTech said, “The Fiji systems are the ideal complement to their materials research efforts in order to support the introduction of new materials into their semiconductor device fabrication process. Tyndall carefully selected the plasma assisted ALD Fiji system as the tool most suited to support their research efforts.”

Alan Blake, Tyndall’s process engineer said, “In terms of performance, the dual chamber system provides excellent process versatility, more functionality, and fits in a very small footprint as compared to competitive products.”

The Tyndall Institute is the largest Micro/NanoElectronics; Photonics and Microsystems research institute in Ireland.

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