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Toshiba gets upgrade to imprint litho system from Molecular Imprints

17 February 2010 | By Mark Osborne | News > Lithography

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Toshiba’s Device Process Development Center in Japan, has had its Molecular Imprints ‘Imprio’ 250 System upgraded to offer better mix and match overlay performance for 20nm full field resolution R&D device development. The system also has better wafer automation handling.

“In all of the key technical categories from overlay control to defectivity levels, our imprint lithography systems are meeting their benchmarks as we move to support volume production with cutting-edge technology," commented Mark Melliar-Smith, CEO of Molecular Imprints.

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