Online information source for semiconductor professionals
Toshiba gets upgrade to imprint litho system from Molecular Imprints
Popular articles
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
New Product: ASML Brionâ??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011
Toshiba’s Device Process Development Center in Japan, has had its Molecular Imprints ‘Imprio’ 250 System upgraded to offer better mix and match overlay performance for 20nm full field resolution R&D device development. The system also has better wafer automation handling.
“In all of the key technical categories from overlay control to defectivity levels, our imprint lithography systems are meeting their benchmarks as we move to support volume production with cutting-edge technology," commented Mark Melliar-Smith, CEO of Molecular Imprints.