Online information source for semiconductor professionals

Tool Order: Vistec sells electron beam lithography system to Paul Scherrer Institute

26 May 2008 | By Síle Mc Mahon | News > Lithography

Popular articles

Voltaix names Peter Smith as CEO - 09 November 2011

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

VistecSwiss research facility, the Paul Scherrer Institute (PSI), has purchased an EBPG5000plus electron beam lithography system from Vistec Lithography. The system will be used at the Laboratory for Micro– and Nanotechnology (LMN) for the research on the optic, electronic, and magnetic properties of nanostructures as well as for the development of nano-devices for internal and external customers.

“The system will help us to keep track of our challenging research roadmap” says Dr. Christian David, Nanopatterning Group Manager at the LMN.

Related jobs

No related jobs found, sorry!

Related articles

Huazhong University partners with Vistec - 13 April 2010

Tool Order: German institute selects e-beam litho system from Vistec - 13 January 2009

Tool order: Vistec ships e-beam lithography system to Helmholtz-Zentrum Berlin - 26 March 2009

Tool Order: ETH Zurich purchases Vistec’s EBPG5200 for new nanotechnology centre - 14 February 2011

Vistec ships e-beam tool to Moscow Institute for photomask requirements - 15 December 2009

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: