The University of Notre Dame, Notre Dame, Indiana, has purchased Vistec’s EBPG5200 e-beam lithography system that is equipped with a modified platform that supports full exposure of substrates to a maximum size of 200mm. The University will use the system for research on new electronic, optoelectronic and magnetic device concepts and associated architectures at Notre Dame’s Center for Nano Science and Technology and the Notre Dame Nanofabrication Facility (NDNF).
"We are continuing to push the performance limits of transistors and other devices, and we are exploring new physical mechanisms for computation to overcome the limits of scaling of conventional transistors," said Patrick Fay, NDNF director. "To address the needs of our research goals, we were looking for a high-performance nanolithography system. The Vistec system addresses a number of new application areas and provides high-quality lithography performance, flexibility and ease of operation. It matched up best with our research needs."