Online information source for semiconductor professionals
Tool Order: two leading IC manufacturers select Qcept’s non-visual defect inspection system
Popular articles
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
Two leading IC manufacturers have purchased non-visual defect (NVD) inspection systems from Qcept Technologies. One customer purchased multiple ChemetriQ 5000 systems for monitoring 3X-nm-design-rule memory and logic product wafers. The second customer purchased a ChemetriQ 5000 system to monitor 3X-nm-design-rule memory wafers. “Leading semiconductor manufacturers are recognizing the growing importance of NVD inspection in ensuring optimal device yields and are turning to Qcept to help enhance their yield management strategies,” noted Bret Bergman, CEO of Qcept Technologies.
Providing NVD inspection on both patterned and unpatterned wafers, the ChemetriQ 5000 can be used for a wide range of tool and line monitoring applications to increase yield learning rates and enable higher sustainable yields.
The systems will be used at the customers’ production fabs for multiple applications, including post-cleaning inspections, reactive ion etch process monitoring and wet cleans process monitoring.