
A leading Asian foundry producer has given FSI International final acceptance of an ‘ORION’ single wafer cleaning system, marking the sixth customer that has adopted the platform and technology. The latest customer qualified the system for 28nm FEOL processes and will use it for all-wet photoresist stripping applications using the high-temperature ‘ViPR’ process. FSI said it expects to recognize revenue for this system in the first quarter of fiscal 2012.