SEMATECH’s metrology program at CNSE’s Albany NanoTech Complex is to use X-Ray Diffraction (XRD) metrology tools from Bruker AXS for advanced semiconductor process control and new materials characterization. Bruker’s ‘D8 FABLINE’ and ‘D8 DISCOVER’ tools have been purchased in the deal.
The D8 FABLINE provides a wide spectrum of techniques, such as rapid X-ray reflectivity (XRR), grazing incidence X-ray diffraction (GID), and high-resolution X-ray diffraction (HR-XRD) in order to facilitate advanced process development and control on strained devices and high-K thin films. The D8 DISCOVER can perform in-plane grazing incidence diffraction (IP-GID) analysis.