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Tool Order: SEMATECH buys Imprio 300 imprint lithography tool from Molecular Imprints

27 February 2008 | By Mark Osborne | News > Lithography

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Imprio 300SEMATECH has purchased an Imprio 300 imprint lithography tool from Molecular Imprints, Inc. (MII) to evaluate the use of the technology for a variety of real-world applications at the 32nm node and below. The collaborative partnership’s initial goal is to demonstrate and enhance overlay performance.  The Imprio 300 will be delivered to SEMATECH at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany in mid-2008.

  "As we move to sub-32nm, the costs and challenges of extending the lithography roadmap continue to escalate," said Michael Lercel, lithography director at SEMATECH. "One of SEMATECH's goals is to identify cost-effective and manufacturable technologies. Nanoimprint has demonstrated excellent resolution and image fidelity, so now is the time to evaluate its manufacturability. That is the goal of the SEMATECH program and our collaboration with Molecular Imprints."

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