Online information source for semiconductor professionals

Tool Order: Samsung Electronics purchases photomask metrology tool from Carl Zeiss SMT

08 January 2009 | By Mark Osborne | News > Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

Dr Oliver Kienzle, Carl Zeiss SMTSamsung Electronics has placed an order with Carl Zeiss SMT for its newly introduced ‘PROVE’ Photomask Registration and Overlay Metrology System. The system is designed for mask manufacturing at the 32nm node and below. Carl Zeiss SMT recently announced another PROVE order from e-beam mask writer supplier NuFlare.

“Considering the current market situation, this is a remarkable success. These orders clearly confirm that PROVE with its high resolution 193nm imaging optics is an enabling technology for mask manufacturing at 32nm node and beyond,” said Dr. Oliver Kienzle, Member of the Board at Carl Zeiss SMT´s Semiconductor Metrology Systems division (SMS) (pictured).

Related articles

Tool Order: Nuflare selects photomask metrology system from Carl Zeiss - 03 December 2008

Carl Zeiss SMT buys Israeli mask metrology company - 06 August 2008

HAP GmbH signs exclusive sales deal with Carl Zeiss SMT - 02 June 2009

Carl Zeiss and Synopsys team on in‚??die metrology solutions for the 32nm - 28 October 2010

New Product: Carl Zeiss SMT‚??s ‚??PROVE‚?? handles mask pattern alignment and registration at 32nm - 25 February 2008

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: