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Tool Order: Samsung Electronics purchases photomask metrology tool from Carl Zeiss SMT

08 January 2009 | By Mark Osborne | News > Lithography

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Dr Oliver Kienzle, Carl Zeiss SMTSamsung Electronics has placed an order with Carl Zeiss SMT for its newly introduced ‘PROVE’ Photomask Registration and Overlay Metrology System. The system is designed for mask manufacturing at the 32nm node and below. Carl Zeiss SMT recently announced another PROVE order from e-beam mask writer supplier NuFlare.

“Considering the current market situation, this is a remarkable success. These orders clearly confirm that PROVE with its high resolution 193nm imaging optics is an enabling technology for mask manufacturing at 32nm node and beyond,” said Dr. Oliver Kienzle, Member of the Board at Carl Zeiss SMT´s Semiconductor Metrology Systems division (SMS) (pictured).

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