Online information source for semiconductor professionals

Tool Order: Renesas adopts Synopsys Proteus OPC for 28nm node

23 March 2010 | By Mark Osborne | News > Lithography

Popular articles

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

Renesas Technology has selected Synopsys Proteus optical proximity correction (OPC) for 28nm node process development using single-exposure photon-based lithography.

"Process-window-aware OPC accuracy was a very important component at this aggressive technology node, but minimizing the cost of ownership was also required," said Hitoshi Sugihara, department manager, DFM & Digital EDA Technology Dept., Design and Development Unit at Renesas Technology Corp. "Proteus' compact physical models, user-programmable recipe with powerful function components, and highly scalable OPC engine allow us to achieve our objectives within a relatively short development cycle."

Related articles

New Product: Synopsys Proteus LRC offers 28nm and below lithography verification - 02 March 2011

Panasonic and Renesas readies 28nm development line - 30 September 2009

New Product: Synopsys adds metrology data into OPC modeling - 12 June 2008

TSMC and Synopsys tackle 28nm lithography hotspots - 24 June 2009

Powerchip taps Nikon and Synopsys in better yielding 42nm flash - 26 February 2009

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: