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Tool Order: Renesas adopts Synopsys Proteus OPC for 28nm node

23 March 2010 | By Mark Osborne | News > Lithography

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Renesas Technology has selected Synopsys Proteus optical proximity correction (OPC) for 28nm node process development using single-exposure photon-based lithography.

"Process-window-aware OPC accuracy was a very important component at this aggressive technology node, but minimizing the cost of ownership was also required," said Hitoshi Sugihara, department manager, DFM & Digital EDA Technology Dept., Design and Development Unit at Renesas Technology Corp. "Proteus' compact physical models, user-programmable recipe with powerful function components, and highly scalable OPC engine allow us to achieve our objectives within a relatively short development cycle."

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