Online information source for semiconductor professionals
Tool Order: RAVE wins multi-system order for reticle haze removal
Popular articles
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
A major independent device manufacturer has placed a multi-system purchase order with RAVE for its ‘Rhazer’ haze removal systems for reticles. The orders were given after an extensive in-fab evaluation of the Rhazer haze removal technology, according to RAVE. “Our Rhazer tools have been operating with great success for some time in world-class device foundries,” noted Barry Hopkins, CEO, RAVE LLC. “This collaborative effort continues to validate the significant cost and value contribution potential RAVE products bring to our customers.”
The first system has already been installed and accepted with additional systems scheduled for delivery over the next year.