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Tool Order: Nuflare selects photomask metrology system from Carl Zeiss

03 December 2008 | By Mark Osborne | News > Lithography

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Nuflare selects photomask metrology system from Carl ZeissE-beam based mask supplier, NuFlare Technology has ordered one of the first available new ‘PROVE’ systems for Photomask Registration and Overlay Metrology from Carl Zeiss SMT. PROVE was developed by a team of more than 40 Carl Zeiss SMT engineers and supported by SEMATECH in its development.

“NuFlare is convinced that the PROVE system of Carl Zeiss SMT enables a dramatic performance improvement of our mask writing systems,” noted Yasuaki Miura, President of NuFlare Technology. “Our efforts of writing masks for EUV and NIL, as well as the emergent Double Patterning and Double Exposure technologies, will be empowered. It seems there is no better combination than PROVE and our mask writing systems to realize the requirements of the future.”

"Both 193nm lithography, including Double Patterning and EUVL, will significantly benefit from the unprecedented accuracy of the system,” commented Frank P. Averdung, Managing Director at Carl Zeiss SMT´s Semiconductor Metrology Systems division (SMS). “With NuFlare’s selection of ZEISS, our system has been acknowledged as the de facto standard for calibration of the leading photomask writing tools.”

Caption: Yasuaki Miura, President of NuFlare Technology (left) and Frank P. Averdung, Carl Zeiss SMT (right).

Yasuaki Miura, President of NuFlare Technology (left) and Frank P. Averdung, Carl Zeiss SMT (right).

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