Online information source for semiconductor professionals
Tool Order: Nanometrics wins follow-on order from memory manufacturer
Popular articles
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
A leading manufacturer of both DRAM and NAND flash memory with multiple
fabs has placed a follow-on order with Nanometrics for 10 Atlas XP
metrology systems, as well as its ‘NanoDiffract’ software. The systems
are to be delivered to multiple factories throughout the fourth quarter
of 2009 and first quarter of 2010 in support of technology re-tooling
for next-generation DRAM and Flash manufacturing.
By combining the advanced optical critical dimension (OCD) performance of our NanoDiffract software with the thin film metrology capability afforded in every Atlas system, we enable performance and cost of ownership advantages that we believe are superior to other thin film and OCD solutions on the market,” commented Michael Fischer, Vice President of Worldwide Sales at Nanometrics. “Our applications team is working closely with our customers to meet critical process control challenges by extending the role of our metrology solutions to improve advanced technology node yields, while simultaneously reducing the overall cost of fab metrology.”
Nanometrics’ Atlas systems enable complex structure and process control non-destructively and can be deployed at all key process steps in line for film thickness, profile and critical dimension control.