A leading manufacturer of both DRAM and NAND flash memory with multiple fabs has placed a follow-on order with Nanometrics for 10 Atlas XP metrology systems, as well as its ‘NanoDiffract’ software. The systems are to be delivered to multiple factories throughout the fourth quarter of 2009 and first quarter of 2010 in support of technology re-tooling for next-generation DRAM and Flash manufacturing.
By combining the advanced optical critical dimension (OCD) performance of our NanoDiffract software with the thin film metrology capability afforded in every Atlas system, we enable performance and cost of ownership advantages that we believe are superior to other thin film and OCD solutions on the market,” commented Michael Fischer, Vice President of Worldwide Sales at Nanometrics. “Our applications team is working closely with our customers to meet critical process control challenges by extending the role of our metrology solutions to improve advanced technology node yields, while simultaneously reducing the overall cost of fab metrology.”
Nanometrics’ Atlas systems enable complex structure and process control non-destructively and can be deployed at all key process steps in line for film thickness, profile and critical dimension control.