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Tool Order: Nanometrics OCD metrology systems bought by Asian foundry

16 September 2011 | By Mark Osborne | News > Wafer Processing

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An Asian foundry has selected the Atlas XP+ optical critical dimension (OCD) metrology system from Nanometrics to be used for process control of advanced logic devices. According to Nanometrics the Atlas XP+ platform was selected over competitive solutions after a comprehensive head-to-head evaluation of technical performance on advanced devices.

“As logic manufacturer’s drive to smaller technology nodes, the combination of new device structures and exotic materials such as 3D structures and high-K metal gates challenge the limits of process control,” said David Doyle, vice president of Nanometrics’ Semiconductor Business Unit. “Nanometrics’ OCD technology is a proven solution to this challenge and has become a key enabler for device yield and lower manufacturing costs.”

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