Online information source for semiconductor professionals

Tool Order: Nanometrics OCD metrology systems bought by Asian foundry

16 September 2011 | By Mark Osborne | News > Wafer Processing

Popular articles

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

An Asian foundry has selected the Atlas XP+ optical critical dimension (OCD) metrology system from Nanometrics to be used for process control of advanced logic devices. According to Nanometrics the Atlas XP+ platform was selected over competitive solutions after a comprehensive head-to-head evaluation of technical performance on advanced devices.

“As logic manufacturer’s drive to smaller technology nodes, the combination of new device structures and exotic materials such as 3D structures and high-K metal gates challenge the limits of process control,” said David Doyle, vice president of Nanometrics’ Semiconductor Business Unit. “Nanometrics’ OCD technology is a proven solution to this challenge and has become a key enabler for device yield and lower manufacturing costs.”

Related articles

Tool order: Leading memory manufacturer receives follow-on Lynx System from Nanometrics - 20 May 2009

Tool Order: Nanometrics receives complete CD metrology suite order - 10 January 2011

Tool order: Memory IC maker places follow-on order for Nanometrics metrology systems - 28 May 2009

Nanometrics enters photovoltaics market with acquisition of Tevet - 08 May 2008

Tool Order: Foundry places multi-system metrology order for 22nm gate etch OCD with Nanometrics - 03 November 2009

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: