Online information source for semiconductor professionals

Tool order: Nanometrics announces multiple system order for Caliper Mosaic Overlay Metrology system

03 August 2009 | By Emma Hughes | News > Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

 Caliper Mosaic  Nanometrics Inc., supplier of process control metrology systems used primarily in the manufacturing and packaging of semiconductors, solar photovoltaics and high-brightness LEDs, has announced a multiple system order for its Caliper Mosaic overlay metrology system.

The systems will be used in production running in conjunction with the Blossom overlay target technology and are expected to be delivered and qualified in the third quarter of 2009. The Caliper Mosaic systems further an initial system purchase in the previous year from a leading DRAM manufacturer for high volume lithography process control.

Nigel Smith, Director of Overlay Product Technology at Nanometrics said, "The Blossom technology is gaining traction as an alternative to established target schemes as it enables our customers to measure up to 28 layers at one time. This simultaneous multi-layer measurement capability is especially beneficial in double patterning processes, offering the best possible precision for advanced lithography process control of critical layers, while substantially reducing total target real-estate requirements."

Related articles

Tool order: Leading memory manufacturer receives follow-on Lynx System from Nanometrics - 20 May 2009

Tool Order: Nanometrics wins order from foundry for 3D wafer-scale packaging process control - 20 December 2010

Tool Order: Foundry places multi-system metrology order for 22nm gate etch OCD with Nanometrics - 03 November 2009

Tool Order: leading-edge IC manufacturing places multiple system order with Nanometrics - 20 August 2009

Tool Order: Nanometrics receives complete CD metrology suite order - 10 January 2011

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: