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Tool order: Nanometrics announces multiple system order for Caliper Mosaic Overlay Metrology system

03 August 2009 | By Emma Hughes | News > Lithography

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 Caliper Mosaic  Nanometrics Inc., supplier of process control metrology systems used primarily in the manufacturing and packaging of semiconductors, solar photovoltaics and high-brightness LEDs, has announced a multiple system order for its Caliper Mosaic overlay metrology system.

The systems will be used in production running in conjunction with the Blossom overlay target technology and are expected to be delivered and qualified in the third quarter of 2009. The Caliper Mosaic systems further an initial system purchase in the previous year from a leading DRAM manufacturer for high volume lithography process control.

Nigel Smith, Director of Overlay Product Technology at Nanometrics said, "The Blossom technology is gaining traction as an alternative to established target schemes as it enables our customers to measure up to 28 layers at one time. This simultaneous multi-layer measurement capability is especially beneficial in double patterning processes, offering the best possible precision for advanced lithography process control of critical layers, while substantially reducing total target real-estate requirements."

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