Online information source for semiconductor professionals
Tool Order: Mattsonâ??s Helios XP RTP system installed at Asia-based foundryâ??s R&D facility
Popular articles
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
A leading Asian foundry has installed a Helios XP rapid thermal processing (RTP) system from Mattson Technology at its R&D facility. The follow-on evaluation system expands Mattson's RTP installed base at this foundry where the Helios XP has been established as the tool of record and is currently being qualified for next-generation process development, according to the company."The Helios XP's thermal uniformity control across the broadest temperature range gives our customers a wider process flexibility in the same system lowering their cost-of-ownership, while the system's unique HotShield™ technology suppresses pattern loading and temperature effects, enabling improved device yield on advanced IC nodes,” commented Andreas Toennis, Senior Vice President and General Manager of Mattson Technology's Thermal Products Group.