Online information source for semiconductor professionals
Tool Order: Mattson wins strip system order for 32nm HKMG development
Popular articles
Voltaix names Peter Smith as CEO - 09 November 2011
Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010
TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
Mattson Technology has gained an order for its Suprema photoresist strip system from a global semiconductor manufacturer for high-k and metal gate (HKMG) strip application development for 32nm logic devices. Mattson said that it had already shipped the tool and that the customer is expected to be in pilot production in the latter half of 2009.
"Advanced logic devices require new materials such as high-k film to enhance the transistor performance; and process tools must be flexible and robust enough to handle these materials and deliver 'on-wafer' results without any compromise,” commented Neal Holmlund, Sr. Vice President and General Manager of Mattson Technology's Surface Cleaning Group. “Mattson was able to meet our customer's stringent process requirements in a short period of development time. In choosing the Suprema system, the customer cited the extremely high reliability and throughput of the product, coupled with enabling process performance, maturity and extendibility to future technology nodes."