After valuation tests that started in 2008, a leading memory IC manufacturer has placed multiple orders for Mattson Technology’s new ‘paradigmE’ etch system. Mattson claims the new etcher offers superior on-wafer performance, including excellent control of within-wafer uniformity, profile and CD. The Company also expects the shipment of a paradigmE evaluation system to its fourth etch customer in the current first quarter.
“The industry has been demanding a cost effective and technically advanced dielectric etch solution required for leading-edge volume manufacturing,” noted David Dutton, President and CEO of Mattson Technology. “Our unique Faraday-shielded ICP source technology combined with the field-proven, high-productivity platform delivers a clear advantage to our customers seeking advanced etch technology at the lowest cost."
The company said that the paradigmE covers all dielectric etch applications qualified by its previous system, Nexion but met or exceeded all expectations the tool was set.