Online information source for semiconductor professionals
Tool Order: Mattson ships paradigmE Etch system to logic IC manufacturer
Popular articles
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
Mattson Technology has shipped its ‘paradigmE’ etch system to a leading semiconductor manufacturer. The qualification system will be used in back-end-of-line (BEOL) etch applications for the production and development of advanced logic devices. Production revenues are expected to begin in the second half of 2011. "The paradigmE is extending its success at this long-time customer's memory fabs to its new logic facility," said Rene George, vice president and general manager of Mattson Technology's Plasma Products Group. "The system's wide process window enables a range of advanced etch applications at extended technology nodes, delivering excellent processing performance and high throughput at low cost-of-ownership."
The paradigmE is now established at foundry, memory, and logic fabs, according to Mattson.