Online information source for semiconductor professionals

Tool Order: Mattson gains first Nexion etch system order

26 March 2008 | By Obi Oputa | News > Wafer Processing

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

MattsonA memory manufacturer with 300mm fabs in Asia has ordered two Nexion anisotropic etch tools, the first official orders Mattson Technology has received since announcing evaluations were under way with a memory manufacturer in 2006. 

"This order is of particular significance to Mattson," noted Randy Matsuda, Senior Vice President and General Manager of Mattson Technology's Etch Division, "as it is a clear validation that Mattson's advanced technology and leading COO delivers solid value to our customers. By expanding into the Etch arena, we effectively double Mattson's served-available-market and strengthen the Company to capitalize on future growth opportunities."

The Nexion etch system is based on Mattson’s inductively coupled plasma (ICP) source technology and standard wafer transfer platform.

Related articles

Tool Order: Major DRAM manufacturer places follow-on order for Mattson‚??s etch system - 22 April 2009

Tool Order: Mattson receives its largest etch tool order - 09 March 2011

Tool Order: Mattson takes multiple ‚??paradigmE‚?? etch system orders from a leading memory customer - 21 January 2010

Tool Order: Mattson receives strip tool order for 2X NAND flash node development - 10 November 2008

Tool Order: Major Asian foundry places multiple Suprema order with Mattson - 14 July 2008

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: