A major foundry has selected the single wafer Optima XE high energy implanter from Axcelis, which will be used at the foundry’s most advanced production facility, according to the company. Axcelis has the largest installed base of high energy ion implant equipment in the market. The Optima XE was launched in 2007 and provides a range of energy levels from 10keV to 4MeV.
“As foundries move to the sub 32nm era, they require systems that have a wide process envelope and exceptional performance while also providing the economic benefits that will propel them into a leading position, commented Mary Puma, Chairman and CEO of Axcelis. “The Optima XE surpasses the competition in these areas, and we are excited about the potential as this new high energy customer adopts Axcelis' single wafer manufacturing technology."
The toll will be used for high volume manufacturing of a wide variety of logic and memory products, as well as for the development of next generation devices.