A leading logic manufacturer and a member of a key semiconductor industry technology alliance, has purchased a ‘Pulsar’ high-k atomic layer deposition (ALD) tool from ASM International. The system, which was delivered earlier in October, will be used to deposit hafnium-based higk-k gate dielectrics for 32 and 28nm logic devices.
"This order is highly representative of ASM's core strength of taking customers from process development to high volume manufacturing," said Glen Wilk, Product Manager for ALD and Epitaxy at ASM. "We have worked with this customer extensively to demonstrate the Pulsar reactor's ability to scale the gate dielectric and overcome all the challenges of integrating high-k into their device. We have now entered the next phase of our collaboration and are actively engaged in the successful transition to volume manufacturing."