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Tool Order: Largest foundry selects 32nm photomask solutions from Carl Zeiss

31 March 2010 | By Mark Osborne | News > Lithography

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 MeRiT HR 32 Mask Defect Repair System and the Aerial Image Measurement System AIMS 32-193iThe largest semiconductor foundry based in Taiwan has placed orders with Carl Zeiss, for its closed loop mask repair and verification equipment for 32nm node. The order includes the MeRiT HR 32 Mask Defect Repair System and the Aerial Image Measurement System AIMS 32-193i. Last year Carl Zeiss launched the mask qualification and repair systems for the 32nm node.

Dr. Oliver Kienzle, Managing Director of SMS Division of Carl Zeiss SMT said, “As one of the most advanced foundries our customer has to invest strategically to ensure zero defect photomask production for the upcoming 32 and 22nm nodes. For the introduction of the next technology nodes the new generation of AIMS and MeRiT systems are essential components to ensure manufacturing of high-quality photomasks with zero-defects.”  

Kienzle also noted that customers especially appreciate the fully flexible illumination scheme of the AIMS 32-193i and the new high-stability platform concept of the MeRiT HR 32 system, which are extendible EUV lithography requirements.

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