Online information source for semiconductor professionals
Tool Order: Largest foundry selects 32nm photomask solutions from Carl Zeiss
Popular articles
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
The largest semiconductor foundry based in Taiwan has placed orders with Carl Zeiss, for its closed loop mask repair and verification equipment for 32nm node. The order includes the MeRiT HR 32 Mask Defect Repair System and the Aerial Image Measurement System AIMS 32-193i. Last year Carl Zeiss launched the mask qualification and repair systems for the 32nm node.
Dr. Oliver Kienzle, Managing Director of SMS Division of Carl Zeiss SMT said, “As one of the most advanced foundries our customer has to invest strategically to ensure zero defect photomask production for the upcoming 32 and 22nm nodes. For the introduction of the next technology nodes the new generation of AIMS and MeRiT systems are essential components to ensure manufacturing of high-quality photomasks with zero-defects.”
Kienzle also noted that customers especially appreciate the fully flexible illumination scheme of the AIMS 32-193i and the new high-stability platform concept of the MeRiT HR 32 system, which are extendible EUV lithography requirements.
