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Tool Order: HamaTech supplies 30th advanced photomask cleaning system

04 July 2008 | By Mark Osborne | News > Lithography

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MaskTrackHamaTech Advanced Process Equipment (HamaTech APE) has said it has reached a new milestone for its 45nm capable MaskTrack photomask cleaning system with the shipment of its 30th tool.

“Since its introduction, the MaskTrack system has been quickly adopted as the tool of record by mask shops and semiconductor manufacturers worldwide for advanced processing” said Wilma Koolen-Hermkens, Chief Executive Officer of HamaTech APE. “Our MaskTrack system was the first in the industry to deliver proven results for the toughest lithography process cleaning challenges at 45nm and beyond. And, as the one company dedicated to the science of cleaning, we are aligned with key partners in the photolithography process to meet the next technology challenges presented at 22nm and Extreme Ultraviolet Lithography (EUVL)”.

The company said that it is also in final qualification stages for 22nm with an unspecified customer.

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Reader comments

this is a terrible system and even worse company. Relying on the masktrak for mask cleaning will doom your company.
By ben deutsch on 15 July 2009

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