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Tool Order: HamaTech supplies 30th advanced photomask cleaning system
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HamaTech Advanced Process Equipment (HamaTech APE) has said it has
reached a new milestone for its 45nm capable MaskTrack photomask
cleaning system with the shipment of its 30th tool.
“Since its introduction, the MaskTrack system has been quickly adopted
as the tool of record by mask shops and semiconductor manufacturers
worldwide for advanced processing” said Wilma Koolen-Hermkens, Chief
Executive Officer of HamaTech APE. “Our MaskTrack system was the first
in the industry to deliver proven results for the toughest lithography
process cleaning challenges at 45nm and beyond. And, as the one company
dedicated to the science of cleaning, we are aligned with key partners
in the photolithography process to meet the next technology challenges
presented at 22nm and Extreme Ultraviolet Lithography (EUVL)”.
The company said that it is also in final qualification stages for 22nm with an unspecified customer.